Formaldehyde

Formaldehyde

SCHEMBL1304276

C=O.[N-]=[N+]=C1C=CC=CC1Nc1ccccc1

nearest known ligand 0.36

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Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
NFKB1 P19838 1/20 0.36
NFKB2 Q00653 1/20 0.36
RELA Q04206 1/20 0.36
RECQL P46063 1/20 0.32
SMN1; SMN2 Q16637 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL488923 0.95 NFKB1 (0.35) NFKB1NFKB2RELARECQLSMN1; SMN2
Formaldehyde SCHEMBL9845728 0.92 KEAP1 (0.33) NFKB1NFKB2RELA
SCHEMBL10582988 0.89 NFKB1 (0.32) NFKB1NFKB2RELA
SCHEMBL28333387 0.74 NFKB1 (0.37) NFKB1NFKB2RELARECQLSMN1; SMN2
SCHEMBL420045 0.74 NFKB1 (0.37) NFKB1NFKB2RELARECQLSMN1; SMN2
SCHEMBL31514269 0.70 NFKB1 (0.38) NFKB1NFKB2RELARECQLSMN1; SMN2
SCHEMBL27405297 0.70 NFKB1 (0.38) NFKB1NFKB2RELARECQLSMN1; SMN2
SCHEMBL27633331 0.70 NFKB1 (0.38) NFKB1NFKB2RELARECQLSMN1; SMN2
SCHEMBL28392491 0.70 NFKB1 (0.35) NFKB1NFKB2RELARECQLSMN1; SMN2
Water SCHEMBL28875414 0.69 NFKB1 (0.37) NFKB1NFKB2RELARECQLSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 107 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-4491629-A POLYVINYL PYRROLIDONE, POLYVINYL ALCOHOL TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) 1985-01-01 US claimed
EP-1964893-B2 Ink composition, inkjet recording method, printed material, and ink set FUJIFILM CORP (JP) 2021-11-24 EP disclosed
EP-2105478-B1 Inkjet recording method and inkjet recording system FUJIFILM CORP (JP) 2018-02-28 EP disclosed
EP-1964893-B1 Ink composition, inkjet recording method, printed material, and ink set FUJIFILM CORP (JP) 2018-01-24 EP disclosed
US-9855742-B2 Ink composition and recording method SEIKO EPSON CORPORATION (JP) 2018-01-02 US disclosed
US-9855693-B2 Image formation method, decorative sheet, decorative sheet molding, process for producing in-mold molded product, in-mold molded product, and ink set FUJIFILM CORPORATION (JP) 2018-01-02 US disclosed
EP-2298841-B1 Ink composition, and inkjet recording method FUJIFILM CORP (JP) 2017-10-25 EP disclosed
EP-2966133-B1 INKJET INK COMPOSITION, INKJET RECORDING METHOD, PRINTED MATTER AND METHOD OF PRODUCING FORMED PRINTED MATTER FUJIFILM CORP (JP) 2017-09-20 EP disclosed
EP-2088176-B2 Ink composition, inkjet recording method, printed material, and molded printed material FUJIFILM CORP (JP) 2017-06-14 EP disclosed
US-20160214379-A1 INK COMPOSITION AND RECORDING METHOD SEIKO EPSON CORPORATION (JP) 2016-07-28 US disclosed
EP-1688466-A1 Ink composition, ink jet recording method, printed material, method of producing planographic printing plate, and planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2006-08-09 EP disclosed
EP-0554005-B1 Photopolymerisable components of radiation-sensitive compositions AGFA GEVAERT NV (BE) 2002-01-30 EP disclosed
US-5710193-A FOR LITHOGRAPHIC PRINTING PLATE PRODUCTION DUPONT (UK) LIMITED (GB) 1998-01-20 US disclosed
EP-0613056-A1 Screen printing origination film AUTOTYPE INTERNATIONAL LIMITED (GB) 1994-08-31 EP disclosed
EP-0554005-A1 Photopolymerisable components of radiation-sensitive compositions Du Pont (UK) Limited (GB) 1993-08-04 EP disclosed
EP-0024872-B2 A METHOD OF TREATING EXPOSED AND DEVELOPED RADIATION SENSITIVE PLATES IN LITHOGRAPHIC PRINTING PLATE PRODUCTION, COMPOSITIONS FOR USE IN THE METHOD, AND THE USE OF DIAZO ELIMINATING COMPOUNDS IN IMPROVING THE INK RECEPTIVITY OF LITHOGRAPHIC PRINTING IMAGES Vickers Limited (GB) 1988-12-07 EP disclosed
US-4491629-A POLYVINYL PYRROLIDONE, POLYVINYL ALCOHOL TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) 1985-01-01 US disclosed
EP-0024872-B1 A METHOD OF TREATING EXPOSED AND DEVELOPED RADIATION SENSITIVE PLATES IN LITHOGRAPHIC PRINTING PLATE PRODUCTION, COMPOSITIONS FOR USE IN THE METHOD, AND THE USE OF DIAZO ELIMINATING COMPOUNDS IN IMPROVING THE INK RECEPTIVITY OF LITHOGRAPHIC PRINTING IMAGES Vickers Limited (GB) 1984-03-14 EP disclosed
US-4299905-A Water-developable film-forming diazonium compound containing photopolymerizable compositions and negative-working lithographic plates prepared therefrom RHONE-POULENC SYSTEMS (FR) 1981-11-10 US disclosed
EP-0024872-A1 A method of treating exposed and developed radiation sensitive plates in lithographic printing plate production, compositions for use in the method, and the use of diazo eliminating compounds in improving the ink receptivity of lithographic printing images Vickers Limited (GB) 1981-03-11 EP disclosed