SCHEMBL28338598

SCHEMBL28338598

Nc1cc(Oc2ccccc2C(=O)c2ccccc2)ccc1O

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.49
GAA P10253 2/20 0.49
MAPK1 P28482 2/20 0.47
LMNA P02545 2/20 0.47
HPGD P15428 2/20 0.47
ALDH1A1 P00352 1/20 0.47
CYP1A2 P05177 1/20 0.47
PGR P06401 1/20 0.47
CYP2D6 P10635 1/20 0.47
SLC6A2 P23975 1/20 0.47
PDE4A P27815 1/20 0.47
CYP2C19 P33261 1/20 0.47
HRH1 P35367 1/20 0.47
HTT P42858 1/20 0.47
SLC6A3 Q01959 1/20 0.47
PDE4D Q08499 1/20 0.47
CTNNB1 P35222 1/20 0.45
F10 P00742 1/20 0.45
STS P08842 2/20 0.45
POLB P06746 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6852210 0.93 STS (0.47) MAPTGAAMAPK1LMNAHPGD
SCHEMBL28338529 0.89 MAPK1 (0.50) MAPTGAAMAPK1LMNAHPGD
SCHEMBL28349990 0.84 MAPT (0.50) MAPTGAAMAPK1CTNNB1F10
SCHEMBL29363963 0.84 MAPT (0.50) MAPTGAAMAPK1CTNNB1F10
SCHEMBL9853728 0.83 LMNA (0.50) MAPTGAAMAPK1LMNAHPGD
SCHEMBL17267870 0.82 STS (0.47) MAPTGAAMAPK1LMNAHPGD
SCHEMBL9297643 0.82 MAPT (0.49) MAPTGAAMAPK1LMNAHPGD
SCHEMBL3212882 0.81 ELANE (0.50) MAPTGAAMAPK1LMNAHPGD
SCHEMBL29555994 0.81 MAPT (0.50) MAPTGAAMAPK1LMNAHTT
SCHEMBL28535291 0.81 MAPT (0.50) MAPTGAAMAPK1LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 CN disclosed
CN-107429059-B Energy-sensitive resin composition 东京应化工业株式会社 2020-10-23 CN disclosed
CN-106575080-B Energy-sensitive resin composition 东京应化工业株式会社 2020-08-11 CN disclosed
CN-105579907-B Radiation-sensitive composition and pattern production method 东京应化工业株式会社 2019-12-17 CN disclosed