SCHEMBL2834574

SCHEMBL2834574

O=C(/C=C\C(=O)Oc1cccc2ccccc12)Oc1cccc2ccccc12

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 4/20 0.59
ALDH1A1 P00352 3/20 0.59
GAA P10253 2/20 0.59
PGR P06401 1/20 0.59
PTGS1 P23219 1/20 0.59
MAPK1 P28482 1/20 0.59
KMT2A Q03164 4/20 0.57
MEN1 O00255 2/20 0.57
L3MBTL1 Q9Y468 2/20 0.57
RAB9A P51151 1/20 0.57
KDM4E B2RXH2 3/20 0.55
HPGD P15428 2/20 0.55
MAPT P10636 2/20 0.55
ESR1 P03372 1/20 0.54
ESR2 Q92731 1/20 0.54
TDP1 Q9NUW8 1/20 0.51
MMP2 P08253 1/20 0.50
FABP7 O15540 3/20 0.49
FABP3 P05413 3/20 0.49
FABP5 Q01469 3/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10707682 1.00 HSD17B10 (0.59) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL11040570 1.00 HSD17B10 (0.59) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL4168618 0.93 HSD17B10 (0.53) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL4168622 0.93 HSD17B10 (0.53) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL28796708 0.90 HSD17B10 (0.50) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL1338968 0.90 HSD17B10 (0.57) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL1338970 0.90 HSD17B10 (0.57) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL331725 0.89 HSD17B10 (0.49) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL23929229 0.87 HSD17B10 (0.51) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL4949311 0.87 ALDH1A1 (0.57) HSD17B10ALDH1A1GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2065456-B2 RESIN COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL KOATSU GAS KOGYO (JP) 2021-03-31 EP disclosed
CN-110506082-A Aqueous ink composition, ink group, image forming method and resin for printing ink particle FUJIFILM CORP 2019-11-26 CN disclosed
CN-109071986-A Ink group and image recording process 富士胶片株式会社 2018-12-21 CN disclosed
CN-107429096-A Ink group and image forming method 富士胶片株式会社 2017-12-01 CN disclosed
CN-107406701-A Aqueous ink composition, ink group, image forming method and resin particle 富士胶片株式会社 2017-11-28 CN disclosed
US-8609763-B2 Resin composition for vibration damping material and vibration damping material KOATSU GAS KOGYO CO., LTD. (JP) 2013-12-17 US disclosed
US-20100010107-A1 RESIN COMPOSITION FOR VIBRATION DAMPING MATERIAL AND VIBRATION DAMPING MATERIAL KOATSU GAS KOGYO CO., LTD. (JP) 2010-01-14 US disclosed
EP-2065456-A1 RESIN COMPOSITION FOR DAMPING MATERIAL AND DAMPING MATERIAL Koatsu Gas Kogyo Co., Ltd. (JP) 2009-06-03 EP disclosed
CN-1063870-A Ring-substituted 2-amino-1, 2, 3, 4-tetrahydronaphthalenes and 3-aminochromanes LILLY CO ELI (US) 1992-08-26 CN disclosed
EP-0031997-B2 POLYMERISATION PROCESS FOR PRODUCTION OF POLYMER MICROPARTICLES OF HIGH REFRACTIVE INDEX AND COATING COMPOSITIONS CONTAINING THEM IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1988-09-14 EP disclosed
US-4427820-A STYRENE, MALEIC ACID DERIVATIVE, EMULSION POLYMERIZATION IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1984-01-24 US disclosed
US-4308180-A TIRE TREADS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1981-12-29 US disclosed
EP-0031997-A1 Polymerisation process for production of polymer microparticles of high refractive index and coating compositions containing them IMPERIAL CHEMICAL INDUSTRIES PLC (GB) 1981-07-15 EP disclosed