SCHEMBL1338970

SCHEMBL1338970

CC=CC(=O)Oc1cccc2ccccc12

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HSD17B10 Q99714 4/20 0.57
▸ ALDH1A1 P00352 4/20 0.57
▸ GAA P10253 2/20 0.57
▸ PGR P06401 1/20 0.57
▸ PTGS1 P23219 1/20 0.57
▸ MAPK1 P28482 1/20 0.57
▸ KMT2A Q03164 3/20 0.51
▸ MEN1 O00255 1/20 0.51
▸ RAB9A P51151 1/20 0.51
▸ L3MBTL1 Q9Y468 1/20 0.51
▸ ESR1 P03372 1/20 0.49
▸ ESR2 Q92731 1/20 0.49
▸ KDM4E B2RXH2 4/20 0.47
▸ HPGD P15428 3/20 0.46
▸ TDP1 Q9NUW8 1/20 0.46
▸ MMP2 P08253 1/20 0.46
▸ MAPT P10636 1/20 0.45
▸ FABP7 O15540 4/20 0.44
▸ FABP3 P05413 4/20 0.44
▸ FABP5 Q01469 4/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1338968 1.00 HSD17B10 (0.57) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL2834574 0.90 HSD17B10 (0.59) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL10707682 0.90 HSD17B10 (0.59) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL11040570 0.90 HSD17B10 (0.59) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL20788563 0.89 ALDH1A1 (0.53) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL4168618 0.83 HSD17B10 (0.53) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL4168622 0.83 HSD17B10 (0.53) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL23929229 0.81 HSD17B10 (0.51) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL4949311 0.81 ALDH1A1 (0.57) HSD17B10ALDH1A1GAAPGRPTGS1
SCHEMBL1157729 0.81 ESR1 (0.74) HSD17B10ALDH1A1GAAPGRPTGS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110191797-A Photon crystal structure and anti-fake color conversion coatings film comprising it 韩国化学研究院 2019-08-30 — — CN disclosed
EP-1586945-B1 ALKALI-SOLUBLE GAP FILLING MATERIAL FORMING COMPOSITION FOR LITHOGRAPHY NISSAN CHEMICAL IND LTD (JP) 2015-07-29 — — EP disclosed
US-8822724-B2 Method for producing carboxylic acid amide SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-09-02 — — US disclosed
US-8795858-B2 Magnetic recording medium and method of manufacturing the same FUJIFILM CORPORATION (JP) 2014-08-05 — — US disclosed
US-8632896-B2 Radiation-curable vinyl chloride copolymer, radiation-curable composition, and magnetic recording medium FUJIFILM CORPORATION (JP) 2014-01-21 — — US disclosed
US-8617728-B2 Magnetic tape and method of manufacturing the same FUJIFILM CORPORATION (JP) 2013-12-31 — — US disclosed
US-8603652-B2 Magnetic recording medium FUJIFILM CORPORATION (JP) 2013-12-10 — — US disclosed
EP-2599769-A1 METHOD FOR PRODUCING CARBOXYLIC ACID AMIDE Sumitomo Chemical Company Limited (JP) 2013-06-05 — — EP disclosed
US-20130123505-A1 METHOD FOR PRODUCING CARBOXYLIC ACID AMIDE SUMITOMO CHEMICAL COMPANY, LIMITED 2013-05-16 — — US disclosed
US-20110274947-A1 MAGNETIC RECORDING MEDIUM FUJIFILM CORPORATION (JP) 2011-11-10 — — US disclosed
US-20080281058-A1 PROCESS FOR PRODUCING ACRYLONITRILE-CONTAINING POLYMER LATEX FUJIFILM CORPORATION (JP) 2008-11-13 — — US disclosed
US-20080176151-A1 DYE-CONTAINING CURABLE COMPOSITION, COLOR FILTER, AND PRODUCING PROCESS THEREOF FUJIFILM CORPORATION 2008-07-24 — — US disclosed
EP-1935910-A2 Process for producing acrylonitrile-containing polymer latex FUJIFILM Corporation (JP) 2008-06-25 — — EP disclosed
US-20080096132-A1 mixing a polymerizable monomer in which acrylonitrile accounts for 70% by weight or more of a total of the polymerizable monomer, water and an alkali metal persulfate polymerization initiator to conduct emulsion polymerization; distilling off unpolymerized monomers; chemical resistance film, gas barrier FUJIFILM CORPORATION 2008-04-24 — — US disclosed
US-7361718-B2 Alkali-soluble gap fill material forming composition for lithography NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2008-04-22 — — US disclosed
US-7358033-B2 Dye-containing curable composition, color filter, and producing process thereof FUJIFILM CORPORATION (JP) 2008-04-15 — — US disclosed
EP-1905787-A2 Polymer latex of high acrylonitrile content, film, pattern forming material and lithographic printing plate precursor using the same, and method for production of polymer latex FUJIFILM Corporation (JP) 2008-04-02 — — EP disclosed
US-20060041078-A1 Alkali-soluble gap filling material forming composition for lithography NISSAN CHEMICAL INDUSTRIES, LTD 2006-02-23 — — US disclosed
EP-1586945-A1 ALKALI-SOLUBLE GAP FILLING MATERIAL FORMING COMPOSITION FOR LITHOGRAPHY Nissan Chemical Industries, Ltd. (JP) 2005-10-19 — — EP disclosed
US-20030232259-A1 Dye-containing curable composition, color filter, and producing process thereof FUJI PHOTO FILM CO., LTD. 2003-12-18 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130123505-A1 METHOD FOR PRODUCING CARBOXYLIC ACID AMIDE HCAR2, NAAA, FAAH2 HSD17B10 254/4885ALDH1A1 161/4885GAA 2008/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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