Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.80 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.57 |
| ▸ | CASP6 | P55212 | 1/20 | 0.57 |
| ▸ | ACHE | P22303 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.38 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.38 |
| ▸ | CXCL12 | P48061 | 1/20 | 0.38 |
| ▸ | ESR1 | P03372 | 2/20 | 0.35 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | MAOA | P21397 | 1/20 | 0.35 |
| ▸ | FYN | P06241 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30315885 | 0.89 | SHBG (1.00) | SHBGKDM4ECASP6MAPTLMNA | |
| SCHEMBL8760761 | 0.89 | SHBG (0.70) | SHBGKDM4ECASP6ACHEMAPT | |
| SCHEMBL209447 | 0.89 | SHBG (1.00) | SHBGKDM4ECASP6MAPTLMNA | |
| SCHEMBL21096810 | 0.87 | SHBG (0.79) | SHBGKDM4ECASP6ACHEMAPT | |
| SCHEMBL25446766 | 0.87 | SHBG (0.74) | SHBGKDM4ECASP6LMNAHTT | |
| SCHEMBL31265753 | 0.87 | SHBG (0.62) | SHBGKDM4ECASP6ACHEMAPT | |
| SCHEMBL10821832 | 0.87 | SHBG (0.62) | SHBGKDM4ECASP6ACHEMAPT | |
| SCHEMBL670778 | 0.85 | SHBG (0.58) | SHBGKDM4ECASP6ACHEMAPT | |
| Water SCHEMBL31169663 | 0.85 | SHBG (0.92) | SHBGKDM4ECASP6LMNAHTT | |
| SCHEMBL27583607 | 0.85 | SHBG (0.71) | SHBGKDM4ECASP6MAPTLMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 293 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115850316-A | Silicon-containing polyphenyl sulfonium salt monomolecular resin and photoresist composition thereof | 中国科学院理化技术研究所 | 2023-03-28 | — | — | CN | claimed |
| US-11520083-B2 | Member, imaging apparatus, and method for producing member | CANON KABUSHIKI KAISHA (JP) | 2022-12-06 | — | — | US | claimed |
| CN-111978224-B | Sulfur-containing monomolecular resin and photoresist composition thereof | 中国科学院理化技术研究所 | 2022-10-28 | — | — | CN | claimed |
| CN-112142955-B | Adamantane-polyphenol oligomer, photoresist composition and application thereof | 中国科学院理化技术研究所 | 2022-04-29 | — | — | CN | claimed |
| CN-112142769-B | Silicon-containing polyphenyl monomolecular resin and photoresist composition thereof | 中国科学院理化技术研究所 | 2022-02-01 | — | — | CN | claimed |
| CN-112142769-A | Silicon-containing polyphenyl monomolecular resin and photoresist composition thereof | 中国科学院理化技术研究所 | 2020-12-29 | — | — | CN | claimed |
| CN-112142955-A | Adamantane-polyphenol oligomer, photoresist composition and application thereof | 中国科学院理化技术研究所 | 2020-12-29 | — | — | CN | claimed |
| CN-111978224-A | Sulfur-containing monomolecular resin and photoresist composition thereof | 中国科学院理化技术研究所 | 2020-11-24 | — | — | CN | claimed |
| US-9454076-B2 | Molecular glass photoresists containing bisphenol a framework and method for preparing the same and use thereof | INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) | 2016-09-27 | — | — | US | claimed |
| CN-104144908-B | Spirofluorene derivative molecular glass, preparation method thereof and application thereof in photoetching | TECHNICAL INSTITUTE OF PHYSICS AND CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2016-02-03 | — | — | CN | claimed |
| CN-103304385-B | Molecular glass photoresist containing bisphenol A skeleton structure as well as preparation method and application thereof | CHINESE ACAD INST CHEMISTRY | 2015-04-15 | — | — | CN | claimed |
| US-20150037735-A1 | MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF | INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) | 2015-02-05 | — | — | US | claimed |
| JP-3000717-A | — | — | None | — | — | JP | disclosed |
| JP-9188642-A | — | — | None | — | — | JP | disclosed |
| JP-4275317-A | — | — | None | — | — | JP | disclosed |
| WO-2026105628-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | 日産化学株式会社 | 2026-05-21 | — | — | WO | disclosed |
| US-4345054-A | High-molecular-weight novolak types substituted phenolic resins and process for preparation thereof | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1982-08-17 | — | — | US | disclosed |
| EP-0032062-A2 | High-molecular-weight novolak substituted phenolic resins and their preparation | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1981-07-15 | — | — | EP | disclosed |
| US-4067933-A | OXIDATION RESISTANCE | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1978-01-10 | — | — | US | disclosed |
| US-3959221-A | OXIDATIVE DEGRADATION | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 1976-05-25 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20150037735-A1 | MOLECULAR GLASS PHOTORESISTS CONTAINING BISPHENOL A FRAMEWORK AND METHOD FOR PREPARING THE SAME AND USE THEREOF | ETV6, ETV1, ESR1 | SHBG 238/4885KDM4E 274/4885CASP6 2922/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.