SCHEMBL28348441

SCHEMBL28348441

C1=CCC(c2ccccc2)=C1.[Fe]

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
SIGMAR1 Q99720 1/20 0.34
HTR2C P28335 1/20 0.33
RAB9A P51151 2/20 0.32
NPC1 O15118 1/20 0.32
LMNA P02545 1/20 0.32
NISCH Q9Y2I1 1/20 0.31
SLC22A2 O15244 1/20 0.31
SLC22A1 O15245 1/20 0.31
SLC22A3 O75751 1/20 0.31
SLC6A4 P31645 1/20 0.31
HPGD P15428 1/20 0.31
CHRNB4 P30926 1/20 0.30
CHRNA3 P32297 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL526305 0.98 ALDH1A1 (0.38) ALDH1A1SIGMAR1HTR2CRAB9ANPC1
Water SCHEMBL27277454 0.95 ALDH1A1 (0.36) ALDH1A1SIGMAR1HTR2CRAB9ANPC1
SCHEMBL11005839 0.95 SIGMAR1 (0.39) ALDH1A1SIGMAR1HTR2CRAB9ANPC1
SCHEMBL1116101 0.95 ALDH1A1 (0.36) ALDH1A1SIGMAR1HTR2CRAB9ANPC1
SCHEMBL9142445 0.95 ALDH1A1 (0.36) ALDH1A1SIGMAR1HTR2CRAB9ANPC1
SCHEMBL9143605 0.95 ALDH1A1 (0.36) ALDH1A1SIGMAR1HTR2CRAB9ANPC1
SCHEMBL28270415 0.93 ALDH1A1 (0.41) ALDH1A1RAB9ANPC1SLC22A2SLC22A1
Biphenyl SCHEMBL27702269 0.88 ALDH1A1 (0.45) ALDH1A1RAB9ANPC1NISCHSLC22A2
Biphenyl SCHEMBL27484108 0.83 KMO (0.42) ALDH1A1NPC1NISCHSLC6A4
SCHEMBL27336597 0.80 SLC6A2 (0.39) ALDH1A1NISCHSLC6A4HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113614130-B Curable resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2024-05-03 CN disclosed
CN-113168093-B Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2024-04-30 CN disclosed
CN-117940516-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2024-04-26 CN disclosed
CN-117881745-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and compound 富士胶片株式会社 2024-04-12 CN disclosed
CN-117836916-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, treatment liquid, and resin composition 富士胶片株式会社 2024-04-05 CN disclosed
CN-117836715-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and alkali generator 富士胶片株式会社 2024-04-05 CN disclosed
CN-117751326-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, resin composition, cured product, laminate, and semiconductor device 富士胶片株式会社 2024-03-22 CN disclosed
CN-117730280-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, resin composition, cured product, laminate, and semiconductor device 富士胶片株式会社 2024-03-19 CN disclosed
CN-117715982-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2024-03-15 CN disclosed
CN-117642442-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2024-03-01 CN disclosed
CN-112752798-A Resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2021-05-04 CN disclosed
CN-112639615-A Photosensitive resin composition, cured film, laminate, method for producing cured film, semiconductor element, and thermoalcogenating agent 富士胶片株式会社 2021-04-09 CN disclosed
CN-112639616-A Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2021-04-09 CN disclosed
CN-112513219-A Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2021-03-16 CN disclosed
CN-112004887-A Heat conductive layer, photosensitive composition, method for producing heat conductive layer, laminate, and semiconductor device 富士胶片株式会社 2020-11-27 CN disclosed
CN-111936930-A Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2020-11-13 CN disclosed
CN-111919172-A Photosensitive resin composition, cured film, laminate, method for producing same, semiconductor device, and thermal alkali generator used for same 富士胶片株式会社 2020-11-10 CN disclosed
CN-111819306-A Method for producing film, method for producing laminate, method for producing semiconductor device, and composition for film formation 富士胶片株式会社 2020-10-23 CN disclosed
CN-110741318-A Photosensitive resin composition, cured film, laminate, method for producing cured film, semiconductor device, and compound 富士胶片株式会社 2020-01-31 CN disclosed
CN-110692018-A Photosensitive resin composition, polymer precursor, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2020-01-14 CN disclosed