SCHEMBL28355460

SCHEMBL28355460

C=C(C)C(=O)OCCCc1ccccc1[Si](OC)(OC)OC

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.41
POLB P06746 1/20 0.41
APEX1 P27695 1/20 0.41
HTT P42858 1/20 0.41
TSHR P16473 5/20 0.41
THRB P10828 1/20 0.39
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
LMNA P02545 2/20 0.33
AKR1B10 O60218 1/20 0.33
AKR1B1 P15121 1/20 0.33
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32
ELANE P08246 1/20 0.31
ALDH1A1 P00352 1/20 0.31
L3MBTL1 Q9Y468 1/20 0.31
CHRNA7 P36544 1/20 0.31
MTNR1A P48039 1/20 0.31
MTNR1B P49286 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27637386 0.79 TSHR (0.54) TDP1POLBAPEX1HTTTSHR
SCHEMBL15361829 0.77 TSHR (0.44) TDP1POLBAPEX1HTTTSHR
SCHEMBL3517115 0.76 TDP1 (0.44) TDP1POLBAPEX1HTTTSHR
SCHEMBL27882618 0.76 CA12 (0.44) TDP1POLBAPEX1HTTTSHR
SCHEMBL29315497 0.76 POLB (0.46) TDP1POLBAPEX1HTTTSHR
SCHEMBL8666446 0.75 TDP1 (0.43) TDP1POLBAPEX1HTTTSHR
SCHEMBL27695944 0.75 TSHR (0.49) TDP1POLBAPEX1HTTTSHR
Butadiene SCHEMBL5666995 0.75 POLB (0.42) TDP1POLBAPEX1HTTTSHR
SCHEMBL9715816 0.75 TDP1 (0.45) TDP1POLBAPEX1HTTTSHR
Hydrochloric Acid SCHEMBL11309826 0.75 POLB (0.48) TDP1POLBAPEX1HTTTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023011270-A1 POLYMER FILM LAYER, PREPARATION METHOD THEREFOR, AND LED PRODUCT 江苏菲沃泰纳米科技股份有限公司 2023-02-09 WO claimed
CN-113805435-A Photoresist and method 台湾积体电路制造股份有限公司 2021-12-17 CN disclosed
CN-105093826-B Photoresist and method 台湾积体电路制造股份有限公司 2020-01-14 CN disclosed