SCHEMBL28357939

SCHEMBL28357939

CC1CCO1.CCOC(CC)[Si](OC)(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6557411 0.81 THRB (0.36)
SCHEMBL18544153 0.79 EPHX1 (0.32)
SCHEMBL9104668 0.76
SCHEMBL28105214 0.75
SCHEMBL28216760 0.73 EPHX1 (0.45)
SCHEMBL23673323 0.71 ALDH1A1 (0.37)
SCHEMBL28764 0.71 ALDH1A1 (0.37)
SCHEMBL1904684 0.71 ALDH1A1 (0.37)
SCHEMBL2297080 0.70 ALDH1A1 (0.36)
SCHEMBL28394811 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110809739-A Composition for forming silicon-containing resist underlayer film, soluble in alkaline developer 日产化学株式会社 2020-02-18 CN disclosed