SCHEMBL2836595

SCHEMBL2836595

O=[C]Oc1cc[c]cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8142070 0.80 CA2 (0.32)
SCHEMBL7598703 0.76
SCHEMBL10944364 0.75
SCHEMBL1148047 0.74
SCHEMBL2661 0.72
SCHEMBL6813058 0.72
SCHEMBL195648 0.70 CA2 (0.50)
SCHEMBL4776938 0.70 MMP1 (0.38)
SCHEMBL681062 0.69
SCHEMBL95901 0.68 ACHE (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5874193-A HOLE BLOCKING LAYER COMPRISED OF A CROSSLINKED POLYSILOXANE POLYMER; MINIMIZING DARK DECAY XEROX CORPORATION (US) 1999-02-23 US claimed
WO-2023112443-A1 HEAT-CURABLE COMPOSITION, ADHESIVE SHEET, PRINTED WIRING BOARD, AND ELECTRONIC APPLIANCE 東洋インキSCホールディングス株式会社 2023-06-22 WO disclosed
WO-2021132631-A1 THERMALLY CURABLE HARDCOAT AGENT, LAYERED FILM, AND DECORATED MOLDED OBJECT 東洋インキSCホールディングス株式会社 2021-07-01 WO disclosed
WO-2020196721-A1 POLY(AMIC ACID) COMPOSITION, POLYIMIDE COMPOSITION AND POLYIMIDE MOLDED BODY 株式会社大阪ソーダ 2020-10-01 WO disclosed
US-8377626-B2 Methods of forming a pattern using negative-type photoresist compositions SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-02-19 US disclosed
US-20100248134-A1 Methods of forming a pattern using negative-type photoresist compositions SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-09-30 US disclosed
EP-0864592-B1 DIENE RUBBER ZEON CORP (JP) 2004-09-22 EP disclosed
EP-0882738-B1 DIENE RUBBER, PROCESS FOR PRODUCING THE RUBBER AND RUBBER COMPOSITION CONTAINING THE SAME ZEON CORP (JP) 2002-11-20 EP disclosed
US-6399731-B2 SYNTHESIZING POLYMERS USING PHOSPHOROUS-CONTAINING ADDITION-FRAGMENTATION CHAIN TRANSFER AGENTS; MOLECULAR WEIGHT CONTROL THE UNIVERSITY OF AKRON 2002-06-04 US disclosed
US-20020016424-A1 Synthesizing polymers using phosphorous-containing addition-fragmentation chain transfer agents; molecular weight control AKRON, THE UNIVERSITY OF 2002-02-07 US disclosed
US-5874193-A HOLE BLOCKING LAYER COMPRISED OF A CROSSLINKED POLYSILOXANE POLYMER; MINIMIZING DARK DECAY XEROX CORPORATION (US) 1999-02-23 US disclosed
EP-0882738-A1 DIENE RUBBER, PROCESS FOR PRODUCING THE RUBBER AND RUBBER COMPOSITION CONTAINING THE SAME NIPPON ZEON CO., LTD. (JP) 1998-12-09 EP disclosed
EP-0864592-A1 DIENE RUBBER NIPPON ZEON CO., LTD. (JP) 1998-09-16 EP disclosed
US-4898933-A Water-soluble fiber-reactive aminotriazine and vinylsulfone containing azo dyestuffs having carboxy- or carbamoyl pyridinium groups HOECHST AKTIENGESELLSCHAFT (DE) 1990-02-06 US disclosed
US-4861344-A CELLULOSE, AND BLENDS THEREOF HOECHST AKTIENGESELLSCHAFT (DE) 1989-08-29 US disclosed
US-4720446-A Color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 1988-01-19 US disclosed
US-4596756-A Ethylenically unsaturated monomer, unsaturated nitrile containing monomer FUJI PHOTO FILM CO., LTD. (JP) 1986-06-24 US disclosed
EP-0129219-A2 Photographic elements FUJI PHOTO FILM CO., LTD. (JP) 1984-12-27 EP disclosed
US-4371582-A INCORPORATING A WATER INSOLUBLE LATEX FUJI PHOTO FILM CO., LTD. (JP) 1983-02-01 US disclosed
US-4101380-A USING POLYOXYETHYLENE GLYCOL DERIVATIVES AND ACTIBATED CARBOXYLIC ESTERS RESEARCH PRODUCTS REHOVOT LTD. (IL) 1978-07-18 US disclosed