SCHEMBL28375116

SCHEMBL28375116

c1ccc2c(c1)Cc1c-2ccc(-c2ccc(CCOCC3CO3)cc2)c1-c1ccc(CCOCC2CO2)cc1

nearest known ligand 0.40

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
▸ MGLL Q99685 4/20 0.38
▸ MEN1 O00255 1/20 0.34
▸ KMT2A Q03164 1/20 0.34
▸ MMP12 P39900 1/20 0.32
▸ MMP13 P45452 1/20 0.32
▸ PNMT P11086 1/20 0.32
▸ TSHR P16473 1/20 0.31
▸ TDP1 Q9NUW8 1/20 0.31
▸ PGR P06401 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28234626 0.94 MEN1 (0.43) MGLLMEN1KMT2ATSHR
SCHEMBL28231068 0.86 TDP1 (0.38) MGLLPNMTTDP1PGR
SCHEMBL3433160 0.86 TDP1 (0.38) MGLLPNMTTDP1PGR
SCHEMBL28376631 0.86 TDP1 (0.38) MEN1KMT2APNMTTSHRTDP1
SCHEMBL28054482 0.83 MEN1 (0.45) MGLLMEN1KMT2APNMTTSHR
SCHEMBL9069715 0.81 TDP1 (0.49) MEN1KMT2APNMTTSHRTDP1
SCHEMBL28226545 0.78 MGLL (0.32) MGLLMEN1KMT2ATSHR
SCHEMBL28226538 0.77 MEN1 (0.33) MEN1KMT2ATSHR
SCHEMBL28226637 0.77 PNMT (0.38) MGLLMEN1KMT2APNMTTSHR
SCHEMBL28263076 0.77 MMP12 (0.41) MEN1KMT2AMMP12MMP13PNMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118222209-A Black optical film, cured film and application thereof 杭州福斯特电子材料有限公司 2024-06-21 — — CN disclosed
CN-110007557-B Curable composition, film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2024-04-12 — — CN disclosed
CN-108957956-B Curable composition, cured product, cured film, display panel, and method for producing cured product 东京应化工业株式会社 2024-04-02 — — CN disclosed
CN-107561860-B Photosensitive resin composition and application thereof 东京应化工业株式会社 2022-09-27 — — CN disclosed
CN-107229184-B Colored photosensitive composition, colored cured product obtained therefrom, display element, and method for producing colored cured product 东京应化工业株式会社 2022-06-24 — — CN disclosed
CN-114502613-A Curable composition, cured product, and method for forming cured product 东京应化工业株式会社 2022-05-13 — — CN disclosed
CN-114384758-A Black photosensitive resin composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2022-04-22 — — CN disclosed
CN-114384757-A Black photosensitive resin composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2022-04-22 — — CN disclosed
CN-107229185-B Energy-sensitive composition, cured product, and method for producing cured product 东京应化工业株式会社 2022-04-15 — — CN disclosed
CN-114127228-A Wavelength conversion film, composition for forming wavelength conversion film, and method for producing cluster-containing quantum dot 东京应化工业株式会社 2022-03-01 — — CN disclosed
CN-114068593-A Method for manufacturing solid-state imaging device, laminate, and dry film 东京应化工业株式会社 2022-02-18 — — CN disclosed
CN-107974101-B Colorant dispersion liquid, photosensitive resin composition and method for producing same, cured product, organic EL element, and pattern forming method 东京应化工业株式会社 2021-09-24 — — CN disclosed
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 — — CN disclosed
CN-110997626-A Aromatic amine compound, curing agent for epoxy compound, curable composition, cured product, method for producing cured product, and method for producing aromatic amine compound 东京应化工业株式会社 2020-04-10 — — CN disclosed
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