⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8967299 | 0.75 | — | — | |
| SCHEMBL21964096 | 0.74 | — | — | |
| SCHEMBL31280624 | 0.74 | — | — | |
| SCHEMBL2312724 | 0.74 | — | — | |
| SCHEMBL23149814 | 0.72 | — | — | |
| SCHEMBL4234958 | 0.72 | — | — | |
| SCHEMBL452809 | 0.71 | — | — | |
| SCHEMBL17680 | 0.71 | — | — | |
| SCHEMBL28818414 | 0.70 | — | — | |
| SCHEMBL28458857 | 0.70 | ALDH1A1 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111226175-A | Method for manufacturing semiconductor device using silicon-containing resist underlayer film-forming composition containing organic group having ammonium group | 日产化学株式会社 | 2020-06-02 | — | — | CN | disclosed |