Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.37 |
| ▸ | USP30 | Q70CQ3 | 1/20 | 0.36 |
| ▸ | MMP12 | P39900 | 3/20 | 0.35 |
| ▸ | HPGD | P15428 | 1/20 | 0.35 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | TRPV4 | Q9HBA0 | 1/20 | 0.35 |
| ▸ | ALAD | P13716 | 2/20 | 0.33 |
| ▸ | PTGES | O14684 | 1/20 | 0.33 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | P2RX7 | Q99572 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Benzoic Acid SCHEMBL28409597 | 0.90 | PTGES (0.39) | HDAC6NPC1RAB9AEPHX2USP30 | |
| SCHEMBL30179341 | 0.78 | HDAC6 (0.49) | HDAC6USP30MMP12ALAD | |
| SCHEMBL28714910 | 0.77 | HDAC6 (0.41) | HDAC6NPC1RAB9AEPHX2USP30 | |
| SCHEMBL28457907 | 0.77 | HDAC6 (0.41) | HDAC6NPC1RAB9AEPHX2USP30 | |
| SCHEMBL29029864 | 0.76 | MMP12 (0.39) | HDAC6NPC1RAB9AEPHX2USP30 | |
| SCHEMBL28854036 | 0.74 | HDAC6 (0.42) | HDAC6NPC1RAB9AEPHX2USP30 | |
| Acetic Acid SCHEMBL22497420 | 0.74 | HPGD (0.44) | NPC1RAB9AEPHX2HPGDTDP1 | |
| Phthalic Acid SCHEMBL28453995 | 0.73 | HDAC6 (0.44) | HDAC6MMP12ALAD | |
| Acetic Acid SCHEMBL28712980 | 0.72 | HDAC1 (0.40) | — | |
| SCHEMBL24634212 | 0.69 | EPHX2 (0.42) | NPC1RAB9AEPHX2HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | claimed |
| CN-111752096-B | Photosensitive resin composition for color filter and color filter | 常州正洁智造科技有限公司 | 2022-10-14 | — | — | CN | disclosed |
| CN-115128899-A | Photosensitive resin composition with improved system hue stability | 常州正洁智造科技有限公司 | 2022-09-30 | — | — | CN | disclosed |
| CN-111752091-B | Application of HABI mixed photoinitiator in UVLED photocuring | 常州正洁智造科技有限公司 | 2022-09-06 | — | — | CN | disclosed |
| CN-112835261-B | EO/PO modified 9-phenylacridine photosensitizer and application thereof | 常州强力电子新材料股份有限公司 | 2022-06-07 | — | — | CN | disclosed |
| CN-114442425-A | Curable resin composition, solder resist film formed from the same, interlayer insulating material, and printed wiring board | 常州正洁智造科技有限公司 | 2022-05-06 | — | — | CN | disclosed |
| CN-114326299-A | Photosensitive resin composition, optical filter and application | 常州强力电子新材料股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-114326309-A | Photosensitive resin composition and application thereof | 常州正洁智造科技有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-113929624-A | Pyrazoline compound, photosensitive resin composition and patterning method | 常州强力电子新材料股份有限公司 | 2022-01-14 | — | — | CN | disclosed |
| CN-112062721-A | HABI photoinitiator capable of improving system stability and application thereof | 常州正洁智造科技有限公司 | 2020-12-11 | — | — | CN | disclosed |
| CN-111752091-A | Application of HABI mixed photoinitiator in UVLED photocuring | 常州格林感光新材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111747897-A | Hexaarylbisimidazole photoinitiator and application thereof | 常州格林感光新材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111752100-A | Photosensitive resin composition containing bisimidazole photoinitiator, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111752098-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111752097-A | Self-luminous photosensitive resin composition, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111752096-A | Photosensitive resin composition for color filter and color filter | 常州格林感光新材料有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-111258180-A | Hexaarylbisimidazole mixed photoinitiator and application thereof | 常州格林感光新材料有限公司 | 2020-06-09 | — | — | CN | disclosed |
| CN-111258181-A | Hexaarylbisimidazole mixed photoinitiator | 常州格林感光新材料有限公司 | 2020-06-09 | — | — | CN | disclosed |