Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.46 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.43 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.43 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.42 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methacrylic Acid SCHEMBL17508543 | 0.81 | ALDH1A1 (0.40) | ALDH1A1FKBP1AMEN1KMT2AEPHX1 | |
| SCHEMBL1996946 | 0.78 | ALDH1A1 (0.48) | ALDH1A1EPHX2NPC1RAB9ASMN1; SMN2 | |
| SCHEMBL29117859 | 0.77 | ALDH1A1 (0.51) | ALDH1A1MEN1KMT2ATSHRHCAR2 | |
| SCHEMBL873995 | 0.77 | ALDH1A1 (0.63) | ALDH1A1MEN1KMT2ATSHRHCAR2 | |
| SCHEMBL16865238 | 0.77 | ALDH1A1 (0.63) | ALDH1A1MEN1KMT2ATSHRHCAR2 | |
| SCHEMBL873996 | 0.77 | ALDH1A1 (0.63) | ALDH1A1MEN1KMT2ATSHRHCAR2 | |
| SCHEMBL4317881 | 0.77 | ALDH1A1 (0.63) | ALDH1A1MEN1KMT2ATSHRHCAR2 | |
| SCHEMBL5289694 | 0.76 | ALDH1A1 (0.61) | ALDH1A1MEN1KMT2ATSHRHCAR2 | |
| SCHEMBL22716112 | 0.76 | GRIK1 (0.35) | EPHX1 | |
| SCHEMBL2987392 | 0.76 | GLO1 (0.40) | ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111123643-A | Protective composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2020-05-08 | — | — | CN | disclosed |