Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FAAH | O00519 | 5/20 | 0.41 |
| ▸ | CNR1 | P21554 | 1/20 | 0.41 |
| ▸ | CNR2 | P34972 | 1/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | NAAA | Q02083 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.32 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5486661 | 0.83 | TSHR (0.38) | FAAHCNR1CNR2TSHRALDH1A1 | |
| SCHEMBL6789916 | 0.80 | FAAH (0.54) | FAAHCNR1CNR2TSHRALDH1A1 | |
| SCHEMBL5475493 | 0.80 | ALDH1A1 (0.38) | FAAHCNR1CNR2TSHRALDH1A1 | |
| SCHEMBL20210581 | 0.80 | LMNA (0.39) | FAAHCNR1CNR2TSHRALDH1A1 | |
| SCHEMBL27646125 | 0.79 | ALDH1A1 (0.41) | TSHRALDH1A1NAAAEPHX2THRB | |
| SCHEMBL27381355 | 0.79 | FAAH (0.45) | FAAHCNR1CNR2ALDH1A1MAPT | |
| SCHEMBL28213215 | 0.79 | FAAH (0.62) | FAAHCNR1CNR2ALDH1A1MAPT | |
| SCHEMBL20210660 | 0.78 | LMNA (0.41) | FAAHCNR1CNR2TSHRALDH1A1 | |
| SCHEMBL20210532 | 0.77 | FAAH (0.39) | FAAHCNR1CNR2TSHRALDH1A1 | |
| SCHEMBL17909442 | 0.77 | FAAH (0.49) | FAAHCNR1CNR2ALDH1A1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111123643-A | Protective composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2020-05-08 | — | — | CN | disclosed |