SCHEMBL2843634

SCHEMBL2843634

CCCCCC[N+](CCC)(CCC)CCC

nearest known ligand 0.93

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 4/20 0.87
ALDH1A1 P00352 1/20 0.81
TP53 P04637 1/20 0.81
CYP3A4 P08684 1/20 0.81
ALOX15 P16050 1/20 0.81
TSHR P16473 1/20 0.81
ALOX12 P18054 1/20 0.81
SMN1; SMN2 Q16637 1/20 0.81
HIF1A Q16665 1/20 0.81
HSD17B10 Q99714 1/20 0.81
SLC22A2 O15244 1/20 0.80
DNM1 Q05193 7/20 0.72

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5819412 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5304214 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5304758 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL2303777 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL4374169 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL2871694 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL3207962 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5294484 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5269147 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15
SCHEMBL5299409 1.00 SLC22A1 (0.87) SLC22A1ALDH1A1TP53CYP3A4ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US claimed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US claimed
CN-102516092-A Dicarboxylic hydrogen salt ionic liquid with asymmetric chemical structure and weak acidity, and preparation method thereof YANGZHOU INST OF CHEMISTRY AND CHEMICAL ENGINEERING NANJING UNIVERSITY 2012-06-27 CN claimed
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US disclosed
CN-111849369-B Surface protective film and optical member 日东电工株式会社 2024-04-26 CN disclosed
CN-113382860-B Adhesive sheet and use thereof 日东电工株式会社 2024-03-22 CN disclosed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US disclosed
CN-114258421-A Chemical mechanical polishing composition, cleaning composition, chemical mechanical polishing method and cleaning method CMC材料株式会社 2022-03-29 CN disclosed
CN-113382860-A Adhesive sheet and use thereof 日东电工株式会社 2021-09-10 CN disclosed
WO-2020255862-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD 日本キャボット・マイクロエレクトロニクス株式会社 2020-12-24 WO disclosed
CN-111849369-A Surface protection film and optical member 日东电工株式会社 2020-10-30 CN disclosed
US-20100130629-A1 CATALYST COMPOSITION FOR PRODUCTION OF POLYURETHANE RESIN AND METHOD FOR PRODUCING POLYURETHANE RESIN (AS AMENDED) TOSOH CORPORATION (JP) 2010-05-27 US disclosed
US-20100041916-A1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-02-18 US disclosed
US-20090253924-A1 Ionic liquids miscible with various polar/non-polar solvents and method of preparing the same SAMSUNG ENGINEERING CO., LTD. (KR) 2009-10-08 US disclosed
US-20090253924-A1 Ionic liquids miscible with various polar/non-polar solvents and method of preparing the same SAMSUNG ENGINEERING CO., LTD. (KR) 2009-10-08 US disclosed
CN-101501092-A Catalyst composition for polyurethane resin production and method for producing polyurethane resin TOSOH CORP (JP) 2009-08-05 CN disclosed
EP-2067770-A1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER Wako Pure Chemical Industries, Ltd. (JP) 2009-06-10 EP disclosed
EP-2050775-A1 CATALYST COMPOSITION FOR POLYURETHANE RESIN PRODUCTION AND METHOD FOR PRODUCING POLYURETHANE RESIN Tosoh Corporation (JP) 2009-04-22 EP disclosed
WO-2007006418-A1 IONIC-LIQUID-CONTAINING PRODUCTS FOR DYEING AND/OR BRIGHTENING KERATIN FIBRES HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2007-01-18 WO disclosed
WO-2006131234-A1 COSMETIC COMPOSITIONS COMPRISING IONIC LIQUIDS HENKEL KOMMANDITGESELLSCHAFT AUF AKTIEN (DE) 2006-12-14 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100041916-A1 PROCESS FOR PRODUCTION OF SULFONIC ACID ESTER SULT1A1, SULT2A1, STS SLC22A1 983/4885ALDH1A1 90/4885TP53 4469/4885
US-20090253924-A1 Ionic liquids miscible with various polar/non-polar solvents and method of preparing the same PIP5K1B, PIP4K2B, PIP4K2C SLC22A1 2034/4885ALDH1A1 4513/4885TP53 729/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.