SCHEMBL28447705

SCHEMBL28447705

C=CC[Si](C)(C)Oc1ccc(N)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 6/20 0.39
TSHR P16473 3/20 0.39
MAPK1 P28482 2/20 0.39
ALDH1A1 P00352 7/20 0.38
CYP3A4 P08684 3/20 0.38
TEAD4 Q15561 1/20 0.35
MAPT P10636 4/20 0.35
SMN1; SMN2 Q16637 3/20 0.35
NPC1 O15118 3/20 0.35
RAB9A P51151 3/20 0.35
TP53 P04637 2/20 0.35
HPGD P15428 2/20 0.35
KDM4E B2RXH2 1/20 0.35
NFKB1 P19838 1/20 0.35
NFKB2 Q00653 1/20 0.35
RELA Q04206 1/20 0.35
HSD17B10 Q99714 1/20 0.35
POLB P06746 1/20 0.34
PKM P14618 1/20 0.33
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13822383 0.81 CA4 (0.34) TSHRCYP3A4MAPTSMN1; SMN2RAB9A
SCHEMBL28453251 0.81 TDP1 (0.39) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL13290643 0.79 RAB9A (0.42) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL28440347 0.79 TDP1 (0.41) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL28450771 0.76 TDP1 (0.43) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL11314136 0.75 TDP1 (0.46) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL2767798 0.75 TDP1 (0.43) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL10046721 0.72 MAPT (0.35) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL357605 0.71 TDP1 (0.52) TDP1TSHRMAPK1ALDH1A1CYP3A4
SCHEMBL2335338 0.71 TDP1 (0.52) TDP1TSHRMAPK1ALDH1A1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110099974-B Composition for forming protective layer on substrate 日产化学株式会社 2022-02-25 CN disclosed
CN-111423813-B Composition for forming release layer and release layer 日产化学工业株式会社 2021-11-23 CN disclosed
CN-107406675-B Composition for forming release layer and release layer 日产化学工业株式会社 2020-11-06 CN disclosed
CN-111423813-A Composition for forming release layer and release layer 日产化学工业株式会社 2020-07-17 CN disclosed