SCHEMBL28475425

SCHEMBL28475425

O=CS(c1ccccc1)(c1ccccc1)c1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HTR6 P50406 2/20 0.48
▸ TLR9 Q9NR96 1/20 0.44
▸ ALDH1A1 P00352 6/20 0.43
▸ TDP1 Q9NUW8 3/20 0.43
▸ CA1 P00915 2/20 0.43
▸ CA2 P00918 2/20 0.43
▸ HSD17B10 Q99714 1/20 0.43
▸ CA12 O43570 1/20 0.43
▸ CA3 P07451 1/20 0.43
▸ CA4 P22748 1/20 0.43
▸ CA6 P23280 1/20 0.43
▸ CA5A P35218 1/20 0.43
▸ CA7 P43166 1/20 0.43
▸ PLA2G7 Q13093 1/20 0.43
▸ CA9 Q16790 1/20 0.43
▸ CA13 Q8N1Q1 1/20 0.43
▸ CA14 Q9ULX7 1/20 0.43
▸ CA5B Q9Y2D0 1/20 0.43
▸ TSHR P16473 1/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29164345 0.77 HTR6 (0.48) HTR6TLR9ALDH1A1TDP1CA1
SCHEMBL7124038 0.74 TLR9 (0.61) HTR6TLR9ALDH1A1TDP1CA1
SCHEMBL22269170 0.71 TSHR (0.43) HTR6TLR9ALDH1A1TDP1CA1
(Phenylsulfonyl)Benzene SCHEMBL9405432 0.69 HTR6 (0.78) HTR6TLR9ALDH1A1TDP1CA1
(Phenylsulfonyl)Benzene SCHEMBL11649504 0.67 HTR6 (0.88) HTR6TLR9ALDH1A1TDP1CA1
SCHEMBL24849236 0.65 MAOB (0.48) TLR9ALDH1A1CA1SMN1; SMN2CYP1A2
SCHEMBL92828 0.65 CA1 (0.56) HTR6TLR9ALDH1A1TDP1CA1
SCHEMBL107520 0.65 HTR6 (0.42) HTR6TLR9ALDH1A1TDP1CA1
(Phenylsulfonyl)Benzene SCHEMBL30255 0.65 HTR6 (1.00) HTR6TLR9ALDH1A1TDP1CA1
Disulfone SCHEMBL493732 0.65 HTR6 (0.65) HTR6TLR9ALDH1A1TDP1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114660896-A Composition for forming silicon-containing resist underlayer film, pattern forming method, and silicon compound 信越化学工业株式会社 2022-06-24 — — CN disclosed
CN-111855581-A Method for determining diffusion distance of hardening catalyst 信越化学工业株式会社 2020-10-30 — — CN disclosed
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