Disulfone

Disulfone

SCHEMBL493732

O=S(=O)(c1ccccc1)S(=O)(=O)c1ccccc1

nearest known ligand 0.65

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR6 P50406 2/20 0.65
ALDH1A1 P00352 3/20 0.58
CA1 P00915 2/20 0.58
CA2 P00918 2/20 0.58
SMN1; SMN2 Q16637 2/20 0.58
HSD17B10 Q99714 1/20 0.58
TDP1 Q9NUW8 1/20 0.58
CA12 O43570 1/20 0.58
CA3 P07451 1/20 0.58
CA4 P22748 1/20 0.58
CA6 P23280 1/20 0.58
CA5A P35218 1/20 0.58
CA7 P43166 1/20 0.58
PLA2G7 Q13093 1/20 0.58
CA9 Q16790 1/20 0.58
CA13 Q8N1Q1 1/20 0.58
CA14 Q9ULX7 1/20 0.58
CA5B Q9Y2D0 1/20 0.58
TSHR P16473 1/20 0.58
DUSP3 P51452 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Disulfone SCHEMBL8427811 1.00 HTR6 (0.65) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL13835654 0.87 HTR6 (0.58) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL6363024 0.84 GAA (0.56) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL3191551 0.84 CA2 (0.52) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL9412338 0.84 ALDH1A1 (0.56) HTR6ALDH1A1CA1CA2HSD17B10
SCHEMBL5693533 0.82 ALDH1A1 (0.62) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL6358048 0.82 CA1 (0.62) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL2611767 0.82 HTR6 (0.52) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL3826921 0.82 SMN1; SMN2 (0.62) HTR6ALDH1A1CA1CA2SMN1; SMN2
SCHEMBL13241497 0.80 NAPRT (0.63) HTR6ALDH1A1CA1CA2HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 850 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN claimed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN claimed
CN-115368494-B Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof 瑞红(苏州)电子化学品股份有限公司 2024-03-29 CN claimed
EP-2937850-B1 HEAT-SENSITIVE LABEL AND PREPARATION AND USE METHOD THEREFOR SUZHOU QUALIMARK TECH CO LTD (CN) 2018-11-14 EP claimed
JP-2006514925-A 2006-05-18 JP claimed
EP-1497270-A4 AMIDE COMPOUNDS AND METHODS OF USING THE SAME SMITHKLINE BEECHAM CORP (US) 2006-01-04 EP claimed
US-20050107444-A1 Amide compounds and methods of using the same GLAXOSMITHKLINE LLC 2005-05-19 US claimed
EP-1497270-A1 AMIDE COMPOUNDS AND METHODS OF USING THE SAME SmithKline Beecham Corporation (US) 2005-01-19 EP claimed
WO-2004043939-A1 AMIDE COMPOUNDS AND METHODS OF USING THE SAME SMITHKLINE BEECHAM CORPORATION (US) 2004-05-27 WO claimed
US-RE37729-E1 4-Heteroaryl-1-piperidinealkylamines and derivatives thereof and their therapeutic utility AVENTIS PHARMACEUTICALS INC. 2002-06-04 US claimed
EP-0488561-B1 Acrylic adhesive compositions LORD CORP (US) 1995-01-25 EP claimed
US-4218373-A FOR DYEING WOOL AND POLYAMIDES, DEEP RED TO VIOLET BAYER AKTIENGESELLSCHAFT (DE) 1980-08-19 US claimed
CN-121873631-B Spin-on carbon composition, semiconductor preparation method and semiconductor device Jiageng Innovation Laboratory (CN) 2026-05-26 CN disclosed
CN-122072436-A Negative photosensitive resin composition, cured film, and resist film DIC株式会社 2026-05-22 CN disclosed
CN-122011922-A Bottom anti-reflection coating composition and preparation and application thereof 嘉庚创新实验室 2026-05-12 CN disclosed
US-20260093178-A1 POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION SAMSUNG ELECTRONICS CO., LTD. (KR) 2026-04-02 US disclosed
US-5096962-A Including a sulfonyl compound instead of a sulfide halide in a mixture comprising an unsaturated monomer, an acid and a reducible transition metal compound; bonding metals; storage stability; halide-free; rapid cure LORD CORPORATION (US) 1992-03-17 US disclosed
US-4997737-A Contain sulfonyl group EASTMAN KODAK COMPANY (US) 1991-03-05 US disclosed
US-4948911-A ELECTRON-TRANSPORT AGENTS EASTMAN KODAK COMPANY (US) 1990-08-14 US disclosed
US-4343855-A RELEASE FILM, WEAR RESISTANT FILM OF EPOXYSILANE POLYMER, CHEMICALLY BONDED THERMOPLASTIC PLASTIC COATING MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1982-08-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050107444-A1 Amide compounds and methods of using the same NR1H2, NR1H3, PPARA HTR6 1988/4885ALDH1A1 1665/4885CA1 4088/4885
US-20260093178-A1 POLYMER, METHOD OF PRODUCING THE SAME, RESIST COMPOSITION INCLUDING THE POLYMER, AND PATTERN FORMATION METHOD USING THE RESIST COMPOSITION RPS21, CA11, RPL21 HTR6 4317/4885ALDH1A1 1875/4885CA1 27/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.