SCHEMBL284839

SCHEMBL284839

CCC1CC=CC2C(=O)OC(=O)C12

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.35
KMT2A Q03164 4/20 0.35
NPSR1 Q6W5P4 4/20 0.35
MAPT P10636 2/20 0.35
ATM Q13315 1/20 0.35
POLB P06746 1/20 0.33
HTT P42858 1/20 0.31
KDM4E B2RXH2 1/20 0.31
GMNN O75496 1/20 0.31
PPM1B O75688 1/20 0.31
LMNA P02545 1/20 0.31
PPP1CC P36873 1/20 0.31
TFPI2 P48307 1/20 0.31
RAB9A P51151 1/20 0.31
PPP5C P53041 1/20 0.31
PPP1CA P62136 1/20 0.31
PMP22 Q01453 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
TP53 P04637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7202230 0.87
SCHEMBL7202059 0.84 TP53 (0.34) MEN1KMT2AHTTTP53NFKB1
SCHEMBL10343798 0.77 KDM4E (0.33) MEN1KMT2AKDM4EGMNNPPM1B
SCHEMBL15466 0.77 KDM4E (0.33) MEN1KMT2AKDM4EGMNNPPM1B
SCHEMBL1666472 0.76
Methane SCHEMBL28278679 0.75 KDM4E (0.32) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL10813414 0.73 KDM4E (0.33) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL9516207 0.73 KDM4E (0.33) KDM4EGMNNPPM1BLMNAPPP1CC
SCHEMBL10432287 0.72 CYP3A4 (0.35) MAPTKDM4EGMNNPPM1BLMNA
SCHEMBL10385193 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 207 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106233205-B Photosensitive element, laminate, permanent mask resist, method for producing same, and method for producing semiconductor package 日立化成株式会社 2020-06-23 CN claimed
US-8716413-B2 Photocurable composition HUNTSMAN ADVANCED MATERIALS AMERICAS LLC (US) 2014-05-06 US claimed
US-20110200950-A1 PHOTOCURABLE COMPOSITION HUNTSMAN INTERNATIONAL LLC (US) 2011-08-18 US claimed
EP-2331599-A1 PHOTOCURABLE COMPOSITION Huntsman Advanced Materials (Switzerland) GmbH (CH) 2011-06-15 EP claimed
WO-2010034531-A1 PHOTOCURABLE COMPOSITION HUNTSMAN ADVANCED MATERIALS (SWITZERLAND) GMBH (CH) 2010-04-01 WO claimed
EP-2168994-A1 Photocurable composition Huntsman Advanced Materials (Switzerland) GmbH (CH) 2010-03-31 EP claimed
US-5100767-A Epoxy resins TAMURA KAKEN CO., LTD. (JP) 1992-03-31 US claimed
US-12606662-B2 Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board RESONAC CORPORATION (JP) 2026-04-21 US disclosed
EP-4692934-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE Resonac Corporation (JP) 2026-02-11 EP disclosed
US-12498636-B2 Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board RESONAC CORPORATION (JP) 2025-12-16 US disclosed
EP-3978544-B1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING PRINTED WIRING BOARD RESONAC CORP (JP) 2025-10-08 EP disclosed
US-20250306465-A1 PHOTOSENSITIVE MULTILAYER RESIN FILM, PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR PRODUCING PRINTED WIRING BOARD RESONAC CORP (JP) 2025-10-02 US disclosed
US-20250297129-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, PRINTED WIRING BOARD, AND SEMICONDUCTOR PACKAGE RESONAC CORPORATION (JP) 2025-09-25 US disclosed
US-5034493-A Comprising the reaction product obtained by heating a mixture of a zinc carboxylate, a carboxylic anhydride aknd a phenol or glycidyl ether or ester; colorless; storage stability; fast c uring; optics NEW JAPAN CHEMICAL CO., LTD. (JP) 1991-07-23 US disclosed
EP-0032745-B1 ETHER IMIDES AND PROCESS FOR PRODUCING THE SAME Hitachi, Ltd. (JP) 1987-01-07 EP disclosed
US-4460783-A AMIDATION, CYCLIZATION, DEHYDRATION HITACHI, LTD. (JP) 1984-07-17 US disclosed
EP-0032745-A2 Ether imides and process for producing the same Hitachi, Ltd. (JP) 1981-07-29 EP disclosed
EP-0028419-A2 Imides and process for producing the same Hitachi, Ltd. (JP) 1981-05-13 EP disclosed
US-4097423-A POLYISOCYANATE, ALKALI METAL SILICATE, CONSTRUCTION MATERIALS BAYER AKTIENGESELLSCHAFT (DT) 1978-06-27 US disclosed
US-3959348-A OR CARBOXYLATE GROUPSINORGANIC-ORGANIC PLASTICS BAYER AKTIENGESELLSCHAFT (DT) 1976-05-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12606662-B2 Photosensitive resin composition, photosensitive resin film, multilayered printed wiring board, semiconductor package, and method for producing multilayered printed wiring board MMAB, ELOB, RARB MEN1 1583/4885KMT2A 1867/4885NPSR1 4789/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.