⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7202059 | 0.91 | TP53 (0.34) | — | |
| SCHEMBL284839 | 0.87 | MEN1 (0.35) | — | |
| SCHEMBL10343798 | 0.74 | KDM4E (0.33) | — | |
| SCHEMBL15466 | 0.74 | KDM4E (0.33) | — | |
| SCHEMBL1666472 | 0.71 | — | — | |
| SCHEMBL9516207 | 0.70 | KDM4E (0.33) | — | |
| SCHEMBL10813414 | 0.70 | KDM4E (0.33) | — | |
| SCHEMBL10432287 | 0.70 | CYP3A4 (0.35) | — | |
| SCHEMBL10385193 | 0.69 | — | — | |
| SCHEMBL2297002 | 0.67 | KDM4E (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6602643-B2 | Useful as a protective material for etching, as back-coating material in the production of a shadow mask | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2003-08-05 | — | — | US | disclosed |
| US-20020146629-A1 | Ultraviolet-curable resin composition | TAIYO INK MANUFACTURING CO., LTD. (JP) | 2002-10-10 | — | — | US | disclosed |
| EP-1219680-A1 | ULTRAVIOLET-CURABLE RESIN COMPOSITION | Taiyo Ink Manufacturing Co. Ltd (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-6136506-A | EPOXY RESIN OBTAINED BY EXTENDING CHAINS OF EPOXY COMPOUND BY AN ISOCYANATE COMPOUND HAVING TWO ISOCYANATE GROUPS PER MOLECULE, AN ULTRAVIOLET-CURABLE RESIN HAVING CARBOXYL GROUP AND AN ETHYLENICALLY UNSATURATED GROUP, INITIATOR | GOO CHEMICAL CO., LTD. | 2000-10-24 | — | — | US | disclosed |