SCHEMBL28498596

SCHEMBL28498596

CCC([CH]c1ccc(N2CCOCC2)cc1)(Cc1ccccc1)N(C)C

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 8/20 0.44
ALDH1A1 P00352 7/20 0.44
SMN1; SMN2 Q16637 6/20 0.44
NPC1 O15118 5/20 0.44
RAB9A P51151 5/20 0.44
KDM4E B2RXH2 3/20 0.44
LMNA P02545 4/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
POLB P06746 1/20 0.41
GAA P10253 2/20 0.41
HPGD P15428 2/20 0.41
ALOX12 P18054 1/20 0.41
L3MBTL1 Q9Y468 3/20 0.40
NPSR1 Q6W5P4 1/20 0.40
ESR1 P03372 1/20 0.40
RORC P51449 4/20 0.39
ADRA2A P08913 1/20 0.39
ADRA2B P18089 1/20 0.39
ADRA2C P18825 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6850127 0.81 RORC (0.46) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL2780057 0.79 NPC1 (0.45) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL1577100 0.79 LMNA (0.46) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL172556 0.78 TMEM97 (0.45) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL20141616 0.77 SLC13A5 (0.46) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL123209 0.77 SLC13A5 (0.46) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
Formamide SCHEMBL27646730 0.75 SMN1; SMN2 (0.44) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL20603021 0.74 SLC13A5 (0.44) MAPTSMN1; SMN2L3MBTL1RORC
SCHEMBL1242129 0.74 RORC (0.41) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL29378498 0.74 RORC (0.41) MAPTALDH1A1SMN1; SMN2NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114397797-A Negative photoresist composition containing nano particles 上海玟昕科技有限公司 2022-04-26 CN disclosed
CN-112162463-B Negative high-elasticity photosensitive resin composition 上海玟昕科技有限公司 2021-09-28 CN disclosed
CN-112162463-A Negative high-elasticity photosensitive resin composition 上海玟昕科技有限公司 2021-01-01 CN disclosed