SCHEMBL2850335

SCHEMBL2850335

[N-]=[N+]=NS(=O)(=O)c1ccccc1N1C(=O)c2ccccc2C1=O

nearest known ligand 0.44

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 5/20 0.44
CA1 P00915 2/20 0.44
POLB P06746 1/20 0.41
CA12 O43570 3/20 0.41
CA9 Q16790 3/20 0.40
CA7 P43166 2/20 0.40
NR1H2 P55055 4/20 0.38
NR1H3 Q13133 4/20 0.38
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
CASP1 P29466 1/20 0.37
SCN2A Q99250 1/20 0.36
CES2 O00748 1/20 0.36
ALDH1A1 P00352 1/20 0.36
BCHE P06276 1/20 0.36
GAA P10253 1/20 0.36
CES1 P23141 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18171722 0.83 TLR9 (0.48) CA2CA1CA12CA9CA7
SCHEMBL18173520 0.82 CA2 (0.34) CA2CA1CA12CA9CA7
SCHEMBL11031360 0.80 MYC (0.37) CA2CA7
SCHEMBL10616438 0.76 GAA (0.34) CA2CA1CA12CA9CA7
SCHEMBL20111162 0.76 CA9 (0.58) CA2CA1CA12CA9MEN1
SCHEMBL29211849 0.74 MYC (0.51) CA2CA1POLBCA12CA9
SCHEMBL11393880 0.74 CA2 (0.50) CA2CA1POLBCA12CA9
SCHEMBL11701505 0.72 AKR1B1 (0.39) CASP1ALDH1A1
SCHEMBL30085353 0.70 CA2 (0.47) CA2CA1POLBCA12CA9
SCHEMBL28948958 0.70 CA2 (0.47) CA2CA1POLBCA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1521123-B1 Alkaline Developer for radiation sensitive compositions AGFA GRAPHICS NV (BE) 2013-08-07 EP disclosed
EP-1722275-B1 Method for processing lithographic printing plates AGFA GRAPHICS NV (BE) 2010-10-27 EP disclosed
EP-1722274-B1 Alkaline developer for radiation sensitive compositions AGFA GRAPHICS NV (BE) 2010-09-08 EP disclosed
US-7186498-B2 Alkaline developer for radiation sensitive compositions AGFA GRAPHICS NV (BE) 2007-03-06 US disclosed
US-20060257798-A1 Alkaline developer for radiation sensitive compositions AGFA-GEVAERT (BE) 2006-11-16 US disclosed
US-20060257789-A1 Method for processing lithographic printing plates AGFA-GEVAERT (BE) 2006-11-16 US disclosed
EP-1722274-A1 Alkaline developer for radiation sensitive compositions AGFA-GEVAERT N.V. (BE) 2006-11-15 EP disclosed
EP-1722275-A1 Method for processing lithographic printing plates AGFA-GEVAERT N.V. (BE) 2006-11-15 EP disclosed
US-20050106510-A1 Alkaline developer for radiation sensitive compositions AGFA-GEVAERT (BE) 2005-05-19 US disclosed
EP-1521123-A1 Alkaline Developer for radiation sensitive compositions Agfa-Gevaert (BE) 2005-04-06 EP disclosed
EP-0992854-B1 Concentrate and aqueous developer for image-wise exposed recording materials AGFA GEVAERT (BE) 2003-01-29 EP disclosed
US-6365330-B1 AMINOALCOHOL AND N-ALKOXYLATED MONO- OR POLYFUNCTIONAL AMINES; AMPHOTERIC AND ANIONIC SURFACTANTS; GLUCONIC ACID COMPLEXING AGENT; NO SOLID OR GEL-LIKE PRECIPITATES FORM DURING USE; AGFA-GEVAERT AG (DE) 2002-04-02 US disclosed
EP-0992854-A1 Concentrate and aqueous developer for image-wise exposed recording materials Agfa-Gevaert AG (DE) 2000-04-12 EP disclosed