SCHEMBL28525484

SCHEMBL28525484

[CH2]C(C)C(OC(=O)C=C)Oc1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.46
MTNR1A P48039 1/20 0.39
MTNR1B P49286 1/20 0.39
GAA P10253 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2C9 P11712 1/20 0.38
PKM P14618 1/20 0.38
CYP2C19 P33261 1/20 0.38
HCAR2 Q8TDS4 1/20 0.36
KMT2A Q03164 3/20 0.36
MEN1 O00255 2/20 0.36
ALDH1A1 P00352 1/20 0.36
LMNA P02545 1/20 0.36
TP53 P04637 1/20 0.36
HPGD P15428 1/20 0.36
TSHR P16473 3/20 0.36
TGM2 P21980 1/20 0.36
MAPT P10636 1/20 0.35
RXFP1 Q9HBX9 1/20 0.35
AKT1 P31749 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2868698 0.88 THRB (0.46) THRBMTNR1AMTNR1BGAACYP1A2
SCHEMBL34034 0.82 THRB (0.46) THRBMTNR1AMTNR1BGAACYP1A2
Water SCHEMBL28126876 0.81 THRB (0.45) THRBMTNR1AMTNR1BGAACYP1A2
Acrylic Acid SCHEMBL28252917 0.79 THRB (0.44) THRBMTNR1AMTNR1BGAACYP1A2
Acrylic Acid SCHEMBL7185233 0.79 THRB (0.44) THRBMTNR1AMTNR1BGAACYP1A2
SCHEMBL28010865 0.78 THRB (0.43) THRBMTNR1AMTNR1BGAACYP1A2
SCHEMBL449798 0.78 THRB (0.43) THRBMTNR1AMTNR1BGAACYP1A2
SCHEMBL4953833 0.77 PTGS1 (0.46) THRBKMT2AMEN1ALDH1A1LMNA
SCHEMBL22578982 0.77 RXRA (0.47) THRBGAACYP1A2CYP2C9PKM
Ethylene Glycol SCHEMBL7182341 0.77 THRB (0.45) THRBMTNR1AMTNR1BGAACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112384857-A Photosensitive resin composition, etching method, and method for producing resin structure 三菱制纸株式会社 2021-02-19 CN disclosed