SCHEMBL28527900

SCHEMBL28527900

Cc1c(C(C)C)ccc(C(=O)c2ccccc2)c1I

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCL2 P10415 2/20 0.51
MCL1 Q07820 2/20 0.51
GABRA1 P14867 1/20 0.47
GABRB1 P18505 1/20 0.47
AKR1C3 P42330 2/20 0.41
KMT2A Q03164 3/20 0.40
LMNA P02545 1/20 0.40
ALDH1A1 P00352 2/20 0.39
KDM4E B2RXH2 2/20 0.39
GAA P10253 2/20 0.39
MEN1 O00255 1/20 0.39
USP2 O75604 1/20 0.39
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
MAPT P10636 2/20 0.39
ALOX15 P16050 1/20 0.39
MAPK1 P28482 1/20 0.39
HSD17B10 Q99714 1/20 0.39
HPGD P15428 1/20 0.38
ACE2 Q9BYF1 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28820169 0.85 BCL2 (0.55) BCL2MCL1GABRA1GABRB1AKR1C3
SCHEMBL19834690 0.80 NPSR1 (0.47) AKR1C3KMT2ALMNAALDH1A1KDM4E
SCHEMBL28907697 0.76 HPGD (0.43) AKR1C3KMT2ALMNAALDH1A1KDM4E
SCHEMBL1122739 0.76 BCL2 (0.64) BCL2MCL1GABRA1GABRB1AKR1C3
SCHEMBL10007412 0.73 ALDH1A1 (0.59) AKR1C3KMT2ALMNAALDH1A1KDM4E
SCHEMBL19834641 0.73 AKR1C3 (0.53) AKR1C3KMT2AALDH1A1KDM4EGAA
SCHEMBL28424851 0.72 BCL2 (0.59) BCL2MCL1GABRA1GABRB1AKR1C3
SCHEMBL11695892 0.71 BCL2 (0.68) BCL2MCL1GABRA1GABRB1AKR1C3
SCHEMBL30409815 0.71 ACE2 (0.46) GABRA1GABRB1KMT2AALDH1A1MEN1
SCHEMBL28355059 0.71 BCL2 (0.58) BCL2MCL1GABRA1GABRB1AKR1C3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107428646-B Compounds, resins, and methods for their purification, and uses thereof 三菱瓦斯化学株式会社 2021-03-02 CN disclosed