SCHEMBL28535751

SCHEMBL28535751

CC1(C)C(=O)C[C@@H]1C(=O)O

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
APLNR P35414 1/20 0.36
MEN1 O00255 3/20 0.35
KMT2A Q03164 3/20 0.35
ESR1 P03372 1/20 0.35
SLC1A2 P43004 1/20 0.34
SLC1A1 P43005 1/20 0.34
PTPN1 P18031 1/20 0.33
HTT P42858 1/20 0.33
MAPT P10636 3/20 0.31
ALDH1A1 P00352 3/20 0.31
KDM4E B2RXH2 2/20 0.31
POLB P06746 2/20 0.31
TSHR P16473 1/20 0.31
EGLN1 Q9GZT9 1/20 0.31
LMNA P02545 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28909985 1.00 APLNR (0.36) APLNRMEN1KMT2AESR1SLC1A2
SCHEMBL16822071 1.00 APLNR (0.36) APLNRMEN1KMT2AESR1SLC1A2
SCHEMBL15549635 0.76 ALDH1A1 (0.40) MEN1KMT2AMAPTALDH1A1TSHR
SCHEMBL11466607 0.74 KDM1A (0.36) MEN1KMT2APTPN1ALDH1A1
SCHEMBL28443689 0.74 MEN1 (0.33) APLNRMEN1KMT2AESR1SLC1A2
SCHEMBL1348628 0.73 MEN1 (0.35) APLNRMEN1KMT2AESR1SLC1A2
SCHEMBL30904760 0.71 ALDH1A1 (0.42) MEN1KMT2AHTTMAPTALDH1A1
SCHEMBL11004784 0.71 PTPN1 (0.31) PTPN1
SCHEMBL21987565 0.71 L3MBTL1 (0.36) APLNRMEN1KMT2ASLC1A2SLC1A1
SCHEMBL11008933 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112239407-B Diester compound having dimethylcyclobutane ring, method for producing the same, and method for producing dimethylcyclobutane compound derived from the same 信越化学工业株式会社 2024-05-28 CN disclosed
CN-112239407-A Diester compound having dimethylcyclobutane ring, process for producing the same, and process for producing dimethylcyclobutane compound derived therefrom 信越化学工业株式会社 2021-01-19 CN disclosed