Tetrabuthylammonium

Tetrabuthylammonium

SCHEMBL2853778

CCCCCCc1c2ccccc2c(CCCCCC)c2cc(S(=O)(=O)[O-])ccc12.CCCC[N+](CCCC)(CCCC)CCCC

nearest known ligand 0.46

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KCNH2 Q12809 7/20 0.46
LMNA P02545 1/20 0.46
CYP2D6 P10635 1/20 0.46
CYP2C9 P11712 1/20 0.46
TSHR P16473 1/20 0.46
CYP2C19 P33261 1/20 0.46
HTT P42858 1/20 0.46
HIF1A Q16665 1/20 0.46
KDM4E B2RXH2 2/20 0.37
ALDH1A1 P00352 2/20 0.37
HPGD P15428 2/20 0.37
HSD17B10 Q99714 2/20 0.37
NR1I2 O75469 1/20 0.36
MAPT P10636 1/20 0.36
CTSV O60911 1/20 0.36
CTSL P07711 1/20 0.36
CA2 P00918 1/20 0.35
PSEN1 P49768 1/20 0.35
PSEN2 P49810 1/20 0.35
APH1B Q8WW43 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrabuthylammonium SCHEMBL2853780 0.89 S1PR3 (0.40) KCNH2LMNACYP2D6CYP2C9TSHR
Tetrabuthylammonium SCHEMBL2859336 0.80 MAPK1 (0.39) KCNH2LMNACYP2D6CYP2C9TSHR
SCHEMBL330757 0.76 HTT (0.52) KCNH2LMNACYP2D6CYP2C9TSHR
Tetrabuthylammonium SCHEMBL332036 0.76 KCNH2 (0.48) KCNH2LMNACYP2D6CYP2C9TSHR
SCHEMBL9589451 0.75 CA2 (0.38) LMNAKDM4EALDH1A1HPGDHSD17B10
Tetrabuthylammonium SCHEMBL2641505 0.75 L3MBTL1 (0.45) KCNH2LMNACYP2D6CYP2C9TSHR
Tetrabuthylammonium SCHEMBL9237587 0.75 LMNA (0.68) KCNH2LMNACYP2D6CYP2C9TSHR
SCHEMBL330869 0.74 HTT (0.53) KCNH2LMNACYP2D6CYP2C9TSHR
SCHEMBL330955 0.74 HTT (0.53) KCNH2LMNACYP2D6CYP2C9TSHR
Tetrahexylammonium SCHEMBL331917 0.74 HTT (0.53) KCNH2LMNACYP2D6CYP2C9TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146359-B1 Solid electrolytic capacitor and method for producing the same MURATA MANUFACTURING CO (JP) 2012-05-16 EP disclosed
EP-2146359-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 2010-01-20 EP disclosed
EP-1988556-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KK (JP) 2010-01-13 EP disclosed
EP-0971382-B1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF SHOWA DENKO KK (JP) 2009-04-22 EP disclosed
EP-1158551-B1 SOLID ELECTROLYTIC CAPACITOR AND ITS PRODUCTION METHOD SHOWA DENKO KK (JP) 2008-11-19 EP disclosed
EP-1988556-A2 Solid electrolytic capacitor and method for producing the same Showa Denko K.K. (JP) 2008-11-05 EP disclosed
EP-1811532-A2 Solid electrolytic capacitor and method for producing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 2007-07-25 EP disclosed
EP-1190426-B1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME SHOWA DENKO KK (JP) 2007-05-30 EP disclosed
US-7175781-B2 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. (JP) 2007-02-13 US disclosed
US-20060179627-A1 Valve acting metal having pores, dielectric film formed on surface, and electroconductive polythiophene as solid electrolyte provided on dielectric film; improved moisture/heat/thermal stess resistance SHOWA DENKO K.K. 2006-08-17 US disclosed
US-6517892-B1 Forming electroconductive film filling microfine pores and covering dielectric layer; oxidative solution polymerization; such as cationic polythiophene or polyfuran SHOWA DENKO K.K. (JP) 2003-02-11 US disclosed
US-20020105777-A1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. 2002-08-08 US disclosed
US-6381121-B1 Solid electrolytic capacitor SHOWA DENKO KABUSHIKI KAISHA (JP) 2002-04-30 US disclosed
US-20020039274-A1 SOLID ELECTROLYTE LAYER COMPRISES A COMPOSITION CONTAINING A PI -ELECTRON CONJUGATE POLYMER AND/OR OTHER ELECTRICALLY CONDUCTING POLYMER, A CONDENSED HETEROPOLYCYCLIC POLYMER SHOWA DENKO K.K. 2002-04-04 US disclosed
EP-1190426-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME Showa Denko K K (JP) 2002-03-27 EP disclosed
US-20020034060-A1 VALVE METAL HAVING MICROFINE PORES; DIELECTRIC FILM; LAMELLAR STRUCTURE; HEAT AND STRESS RESISTANCE; WATERPROOFING SHOWA DENKO K.K. 2002-03-21 US disclosed
US-6351370-B1 Solid electrolytic capacitor and method for producing the same SHOWA DENKO K.K. (JP) 2002-02-26 US disclosed
EP-1158551-A1 SOLID ELECTROLYTIC CAPACITOR AND ITS PRODUCTION METHOD Showa Denko K K (JP) 2001-11-28 EP disclosed
WO-2000060620-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR PRODUCING THE SAME SHOWA DENKO K. K. (JP) 2000-10-12 WO disclosed
EP-0971382-A1 SOLID ELECTROLYTIC CAPACITOR AND PROCESS FOR THE PRODUCTION THEREOF Showa Denko K K (JP) 2000-01-12 EP disclosed