SCHEMBL28540565

SCHEMBL28540565

CN(C)c1ccc2cc(C(=O)OC(=O)c3ccccc3)c(=O)oc2c1

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC16A3 O15427 3/20 0.67
MAOB P27338 4/20 0.57
SLC16A1 P53985 2/20 0.54
ALDH1A1 P00352 8/20 0.51
KDM4E B2RXH2 5/20 0.51
RAB9A P51151 2/20 0.51
NPC1 O15118 1/20 0.51
POLB P06746 1/20 0.51
HPGD P15428 4/20 0.50
MIF P14174 3/20 0.50
SMN1; SMN2 Q16637 3/20 0.50
ALOX15 P16050 1/20 0.50
HSD17B10 Q99714 1/20 0.50
MEN1 O00255 2/20 0.47
MAPT P10636 2/20 0.47
KMT2A Q03164 2/20 0.47
ATM Q13315 2/20 0.47
CYP1A2 P05177 2/20 0.47
CYP2C19 P33261 2/20 0.47
USP2 O75604 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL51506 0.85 MAOB (0.76) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL28351884 0.84 KDM4E (0.68) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL24176806 0.82 SLC16A3 (0.72) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL2910106 0.81 SLC16A3 (0.64) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL29202680 0.81 SLC16A3 (0.63) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL839032 0.81 SLC16A3 (1.00) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL2030497 0.79 SLC16A3 (0.81) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL2911594 0.79 MAOB (0.80) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL24803038 0.79 SLC16A3 (0.67) SLC16A3MAOBSLC16A1ALDH1A1KDM4E
SCHEMBL2031972 0.78 SLC16A3 (0.78) SLC16A3MAOBSLC16A1ALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112334833-B Negative photosensitive resin composition, polyimide using same, and method for producing cured relief pattern 旭化成株式会社 2024-09-24 CN disclosed
CN-116868124-A Photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film 旭化成株式会社 2023-10-10 CN disclosed
CN-116802560-A Photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film 旭化成株式会社 2023-09-22 CN disclosed
CN-114253076-A Photosensitive resin composition 旭化成株式会社 2022-03-29 CN disclosed
CN-112334833-A Negative photosensitive resin composition, polyimide using same, and method for producing cured relief pattern 旭化成株式会社 2021-02-05 CN disclosed