Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC16A3 | O15427 | 3/20 | 0.78 |
| ▸ | MAOB | P27338 | 6/20 | 0.72 |
| ▸ | MEN1 | O00255 | 3/20 | 0.72 |
| ▸ | MAPT | P10636 | 3/20 | 0.72 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.72 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.72 |
| ▸ | ATM | Q13315 | 2/20 | 0.72 |
| ▸ | USP2 | O75604 | 1/20 | 0.72 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.72 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.66 |
| ▸ | GAA | P10253 | 2/20 | 0.66 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.66 |
| ▸ | GLA | P06280 | 1/20 | 0.66 |
| ▸ | MIF | P14174 | 1/20 | 0.66 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.66 |
| ▸ | CA12 | O43570 | 2/20 | 0.64 |
| ▸ | CA9 | Q16790 | 2/20 | 0.64 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.61 |
| ▸ | HPGD | P15428 | 3/20 | 0.61 |
| ▸ | NT5E | P21589 | 1/20 | 0.60 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2030497 | 0.89 | SLC16A3 (0.81) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL839032 | 0.88 | SLC16A3 (1.00) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL28943174 | 0.88 | MAOB (0.73) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL14111521 | 0.87 | SLC16A3 (0.76) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL28456792 | 0.87 | SLC16A3 (0.76) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL5466592 | 0.85 | MAOB (0.64) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL24176806 | 0.84 | SLC16A3 (0.72) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL51307 | 0.84 | SLC16A3 (0.72) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL5144937 | 0.84 | SLC16A3 (0.72) | SLC16A3MAOBMEN1MAPTKMT2A | |
| SCHEMBL11225033 | 0.84 | SLC16A3 (0.72) | SLC16A3MAOBMEN1MAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 556 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111522200-B | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2021-07-27 | — | — | CN | claimed |
| CN-111522200-A | Negative PSPI resin for 12-inch silicon wafer and preparation method and application thereof | 中国科学院化学研究所 | 2020-08-11 | — | — | CN | claimed |
| WO-2026100508-A1 | RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND RESIN | 富士フイルム株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12622847-B2 | Organosilicon compound and dental composition containing same | KURARAY NORITAKE DENTAL INC. (JP) | 2026-05-12 | — | — | US | disclosed |
| EP-4736835-A1 | DENTAL POLYMERIZABLE COMPOSITION | Kuraray Noritake Dental Inc. (JP) | 2026-05-06 | — | — | EP | disclosed |
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-28 | — | — | US | disclosed |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-16 | — | — | US | disclosed |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-04-09 | — | — | US | disclosed |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-03-05 | — | — | US | disclosed |
| US-12564543-B2 | Dental composition | KURARAY NORITAKE DENTAL INC. (JP) | 2026-03-03 | — | — | US | disclosed |
| US-20260036904-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2026-02-05 | — | — | US | disclosed |
| EP-0559900-B1 | METHOD OF SURFACE TREATING ROLLING ROLL | NIPPON STEEL CORP (JP) | 1997-12-29 | — | — | EP | disclosed |
| EP-0580108-B1 | A photosensitive polyimide composition | ASAHI CHEMICAL IND (JP) | 1997-03-12 | — | — | EP | disclosed |
| EP-0738928-A2 | Visible-ray polymerization initiator and visible-ray polymerizable composition | TOKUYAMA CORPORATION (JP) | 1996-10-23 | — | — | EP | disclosed |
| EP-0718696-A2 | A photosensitive polyimide composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1996-06-26 | — | — | EP | disclosed |
| US-5397682-A | Polyimide precursor and photosensitive composition containing the same | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1995-03-14 | — | — | US | disclosed |
| WO-1994006057-A1 | POLYIMIDE PRECURSOR AND PHOTOSENSITIVE COMPOSITION CONTAINING THE SAME | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1994-03-17 | — | — | WO | disclosed |
| US-5294297-A | Photocuring | NIPPON STEEL CORPORATION (JP) | 1994-03-15 | — | — | US | disclosed |
| EP-0580108-A2 | A photosensitive polyimide composition | ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) | 1994-01-26 | — | — | EP | disclosed |
| EP-0559900-A1 | METHOD OF SURFACE TREATING ROLLING ROLL | NIPPON STEEL CORPORATION (JP) | 1993-09-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12613465-B2 | Photosensitive resin composition and method for producing cured relief pattern | ARCN1, GLRA1, PSMA1 | SLC16A3 1421/4885MAOB 4827/4885MEN1 3372/4885 |
| US-20260104641-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT | ARCN1, PRDM9, LBR | SLC16A3 3827/4885MAOB 3277/4885MEN1 4037/4885 |
| US-20260099093-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN USING SAME, AND METHOD FOR PRODUCING POLYIMIDE FILM USING SAME | CD79B, ITGA1, PTK2 | SLC16A3 3127/4885MAOB 2517/4885MEN1 2775/4885 |
| US-12564543-B2 | Dental composition | CAD, ARCN1, MAT1A | SLC16A3 3354/4885MAOB 4479/4885MEN1 2119/4885 |
| US-12622847-B2 | Organosilicon compound and dental composition containing same | MSL1, ITGA1, ITGAL | SLC16A3 4091/4885MAOB 3945/4885MEN1 1873/4885 |
| US-20260036904-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED RELIEF PATTERN, AND SEMICONDUCTOR DEVICE | RER1, ASIC1, FRG1 | SLC16A3 3039/4885MAOB 3218/4885MEN1 2602/4885 |
| US-20260063999-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR POLYIMIDE CURED FILM USING SAME, AND POLYIMIDE CURED FILM | ARCN1, PBRM1, LCP1 | SLC16A3 2173/4885MAOB 3403/4885MEN1 958/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.