Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TP53 | P04637 | 1/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | KIF11 | P52732 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28994957 | 0.68 | — | — | |
| SCHEMBL591997 | 0.66 | — | — | |
| SCHEMBL28703048 | 0.65 | — | — | |
| SCHEMBL8522405 | 0.65 | — | — | |
| SCHEMBL6278856 | 0.65 | — | — | |
| Hydrochloric Acid SCHEMBL5072257 | 0.64 | HDAC1 (0.34) | — | |
| SCHEMBL4438733 | 0.64 | CYP3A4 (0.39) | CYP3A4TDP1ALDH1A1TP53TAAR1 | |
| Benzidine SCHEMBL2466323 | 0.63 | ALDH1A1 (0.85) | CYP3A4TDP1ALDH1A1TP53TAAR1 | |
| Benzidine SCHEMBL29120747 | 0.63 | ALDH1A1 (0.85) | CYP3A4TDP1ALDH1A1TP53TAAR1 | |
| Benzidine SCHEMBL9980982 | 0.63 | ALDH1A1 (0.85) | CYP3A4TDP1ALDH1A1TP53TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116925027-A | Compound for photosensitive resin, heat-resistant resin, photosensitive resin composition, patterned film, and display device | 武汉柔显科技股份有限公司 | 2023-10-24 | — | — | CN | disclosed |
| CN-116841121-A | Photosensitive resin composition, method for producing pattern cured film, and use thereof | 武汉柔显科技股份有限公司 | 2023-10-03 | — | — | CN | disclosed |
| CN-116774524-A | Photosensitive resin composition, method for producing pattern cured product, and use thereof | 武汉柔显科技股份有限公司 | 2023-09-19 | — | — | CN | disclosed |
| CN-112940250-B | Photosensitive resin composition and photosensitive resin film | 武汉柔显科技股份有限公司 | 2022-09-23 | — | — | CN | disclosed |
| CN-114326306-A | Photosensitive resin composition, photosensitive resin composition film, and patterned cured product | 武汉柔显科技股份有限公司 | 2022-04-12 | — | — | CN | disclosed |
| CN-112940250-A | Resin, photosensitive resin composition, and photosensitive resin film | 武汉柔显科技股份有限公司 | 2021-06-11 | — | — | CN | disclosed |
| CN-112521296-B | Diamine compound, heat-resistant resin or heat-resistant resin precursor using same, photosensitive resin composition, cured film, and display device | 武汉柔显科技股份有限公司 | 2021-05-11 | — | — | CN | disclosed |
| CN-112521296-A | Diamine compound, heat-resistant resin or heat-resistant resin precursor using same, photosensitive resin composition, cured film, and display device | 武汉柔显科技股份有限公司 | 2021-03-19 | — | — | CN | disclosed |