SCHEMBL28570939

SCHEMBL28570939

O=[N+]([O-])c1ccc(S(=O)(=O)OS(=O)(=O)C(F)(F)F)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA2 P00918 8/20 0.47
CA1 P00915 7/20 0.47
CA9 Q16790 7/20 0.47
CA5A P35218 4/20 0.47
CA12 O43570 5/20 0.47
CA14 Q9ULX7 4/20 0.47
CA3 P07451 3/20 0.47
CA4 P22748 3/20 0.47
CA6 P23280 3/20 0.47
CA7 P43166 3/20 0.47
CA13 Q8N1Q1 3/20 0.47
CA5B Q9Y2D0 3/20 0.47
HSD11B1 P28845 1/20 0.44
MMP1 P03956 1/20 0.43
MMP2 P08253 1/20 0.43
MMP9 P14780 1/20 0.43
MMP8 P22894 1/20 0.43
MMP13 P45452 1/20 0.43
ALDH1A1 P00352 3/20 0.41
LMNA P02545 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL997443 0.83 CA2 (0.59) CA2CA1CA9CA5ACA12
SCHEMBL37687 0.79 CA1 (0.62) CA2CA1CA9CA5ACA12
SCHEMBL29280214 0.78 CA2 (0.53) CA2CA1CA9CA5ACA12
SCHEMBL8847449 0.77 HTR6 (0.42) CA2CA1CA9CA5ACA12
SCHEMBL9418416 0.77 TDP1 (0.46) CA2CA1CA9CA5ACA12
SCHEMBL2822149 0.77 GAA (0.45) CA2CA1CA9CA5ACA12
SCHEMBL29657456 0.76 CA2 (0.55) CA2CA1CA9CA5ACA12
SCHEMBL11093420 0.76 CA2 (0.55) CA2CA1CA9CA5ACA12
SCHEMBL8142887 0.76 CA2 (0.55) CA2CA1CA9CA5ACA12
SCHEMBL29488753 0.75 CA2 (0.59) CA2CA1CA9CA5ACA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112799280-A Application of nitrobenzyl alcohol sulfonate compound as accelerator in photoresist and composition for preparing photoresist 北京科华微电子材料有限公司 2021-05-14 CN claimed
CN-112799280-A Application of nitrobenzyl alcohol sulfonate compound as accelerator in photoresist and composition for preparing photoresist 北京科华微电子材料有限公司 2021-05-14 CN disclosed