SCHEMBL28586502

SCHEMBL28586502

Cl[Zr](Cl)(c1ccccc1)C1c2ccccc2-c2ccccc21

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.35
GPR3 P46089 2/20 0.35
POLB P06746 2/20 0.32
SLC22A2 O15244 1/20 0.32
SLC22A3 O75751 1/20 0.32
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
ATM Q13315 1/20 0.32
HDAC3 O15379 1/20 0.31
HDAC4 P56524 1/20 0.31
HDAC7 Q8WUI4 1/20 0.31
HDAC8 Q9BY41 1/20 0.31
HDAC6 Q9UBN7 1/20 0.31
HDAC9 Q9UKV0 1/20 0.31
HDAC5 Q9UQL6 1/20 0.31
NCOR2 Q9Y618 1/20 0.31
CYP1A2 P05177 2/20 0.31
TSHR P16473 1/20 0.31
ALDH1A1 P00352 1/20 0.31
CYP2D6 P10635 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8755331 0.77 HTR2A (0.38) HTR2AGPR3POLBMEN1KMT2A
SCHEMBL796784 0.77 GPR3 (0.41) HTR2AGPR3POLBSLC22A2SLC22A3
SCHEMBL6547416 0.77 GPR3 (0.41) HTR2AGPR3POLBSLC22A2SLC22A3
SCHEMBL27462918 0.69 GPR3 (0.32) GPR3SLC22A2SLC22A3
SCHEMBL20440936 0.67 GPR3 (0.41) HTR2AGPR3POLBSLC22A2SLC22A3
SCHEMBL7602124 0.67 GPR3 (0.46) HTR2AGPR3POLBSLC22A2SLC22A3
SCHEMBL20480846 0.67 GPR3 (0.33) HTR2AGPR3SLC22A2SLC22A3
SCHEMBL9350868 0.64 GPR3 (0.42) HTR2AGPR3POLBSLC22A2SLC22A3
SCHEMBL7566618 0.64 MAPT (0.40) HTR2AGPR3POLBSLC22A2SLC22A3
SCHEMBL8755072 0.64 MAPT (0.43) HTR2AGPR3POLBMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113168093-B Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2024-04-30 CN disclosed
CN-113383273-B Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2023-11-14 CN disclosed
CN-114402256-A Organic film, method for producing same, composition, laminate, and semiconductor device 富士胶片株式会社 2022-04-26 CN disclosed
CN-113383273-A Photosensitive resin composition, pattern forming method, cured film, laminate, and device 富士胶片株式会社 2021-09-10 CN disclosed
CN-113168093-A Pattern forming method, photosensitive resin composition, cured film, laminate, and device 富士胶片株式会社 2021-07-23 CN disclosed