SCHEMBL28615635

SCHEMBL28615635

CCCCC(CC=C(C)C(N)=O)OC

nearest known ligand 0.37

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CA2 P00918 8/20 0.37
CA1 P00915 3/20 0.37
ZDHHC7 Q9NXF8 1/20 0.33
CTSK P43235 4/20 0.32
ACHE P22303 1/20 0.32
BACE1 P56817 1/20 0.32
ALDH1A1 P00352 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2D6 P10635 1/20 0.31
MAPT P10636 1/20 0.31
CYP2C19 P33261 1/20 0.31
MAPK1 P28482 1/20 0.31
TSHR P16473 1/20 0.30
SLC1A3 P43003 1/20 0.30
SLC1A2 P43004 1/20 0.30
SLC1A1 P43005 1/20 0.30
PRKCA P17252 1/20 0.30
PRKCD Q05655 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4052624 0.87 CA2 (0.37) CA2CA1ZDHHC7CTSKACHE
SCHEMBL548173 0.78 CA2 (0.40) CA2CA1ACHEBACE1MAPK1
SCHEMBL1781330 0.77 CTSK (0.33) CA2CA1CTSKACHEBACE1
SCHEMBL2338167 0.77 CA2 (0.43) CA2CA1ALDH1A1CYP3A4CYP2D6
SCHEMBL2338165 0.77 CA2 (0.43) CA2CA1ALDH1A1CYP3A4CYP2D6
SCHEMBL1781329 0.77 CTSK (0.33) CA2CA1CTSKACHEBACE1
SCHEMBL4053499 0.76 CYP3A4 (0.33) ZDHHC7CTSKCYP3A4CYP2D6CYP2C19
SCHEMBL1660520 0.75 ALDH1A1 (0.31) CA2CA1ALDH1A1
SCHEMBL1660519 0.75 ALDH1A1 (0.31) CA2CA1ALDH1A1
SCHEMBL9057385 0.73 MAPT (0.30) ALDH1A1CYP3A4CYP2D6MAPTCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113311661-A Photoresist underlayer composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2021-08-27 CN disclosed
CN-113314402-A Photoresist composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2021-08-27 CN disclosed
CN-113311662-A Method for manufacturing semiconductor device and photoresist composition 台湾积体电路制造股份有限公司 2021-08-27 CN disclosed