SCHEMBL28633554

SCHEMBL28633554

CCC1c2ccccc2C=CC1(C)N

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 7/20 0.39
HTR2B P41595 6/20 0.39
HTR1A P08908 5/20 0.39
TMEM97 Q5BJF2 4/20 0.39
HTR7 P34969 3/20 0.39
SLC6A2 P23975 3/20 0.39
HTR2C P28335 3/20 0.39
ADRA2B P18089 2/20 0.39
ADRA1A P35348 2/20 0.39
SLC6A3 Q01959 2/20 0.39
ADRA2A P08913 1/20 0.39
ADRB3 P13945 1/20 0.39
DRD4 P21917 1/20 0.39
HRH3 Q9Y5N1 1/20 0.39
HTR2A P28223 3/20 0.39
KDM4E B2RXH2 2/20 0.33
LMNA P02545 1/20 0.33
TP53 P04637 1/20 0.33
CHRM2 P08172 1/20 0.33
CYP3A4 P08684 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28161717 0.82 HTR2A (0.37) SIGMAR1HTR2BHTR1ATMEM97HTR7
SCHEMBL10445171 0.77 HTR2A (0.38) HTR2BSLC6A2HTR2CADRA2BADRA1A
SCHEMBL995535 0.75 HTR2A (0.37) HTR2BSLC6A2HTR2CADRA2BADRA1A
SCHEMBL8075462 0.69 HTR2A (0.33) HTR2A
SCHEMBL20752693 0.67 ADRA2A (0.34) SIGMAR1HTR2BHTR1ATMEM97HTR7
Methane SCHEMBL5718665 0.66 HTR2A (0.35) SIGMAR1HTR2BSLC6A2HTR2CADRA2B
SCHEMBL27942046 0.65 ALDH1A1 (0.36) SIGMAR1HTR2ACYP3A4CYP2D6RET
SCHEMBL19621690 0.63 HTR2A (0.37) SIGMAR1HTR2BSLC6A2HTR2CADRA2B
SCHEMBL11203778 0.63 GAA (0.31) KDM1A
SCHEMBL28725904 0.63 BRD4 (0.36) SIGMAR1HTR2BSLC6A2HTR2CADRA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527680-A Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed