SCHEMBL28636090

SCHEMBL28636090

Nc1ccc(CO)cc1.O=C(O)c1ccc(CO)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.52
TSHR P16473 2/20 0.50
TP53 P04637 1/20 0.50
PRSS1 P07477 1/20 0.47
PRSS2 P07478 1/20 0.47
PRSS3 P35030 1/20 0.47
SMN1; SMN2 Q16637 3/20 0.46
ANPEP P15144 1/20 0.46
ENPEP Q07075 1/20 0.46
NPC1 O15118 2/20 0.45
RAB9A P51151 2/20 0.45
HPGD P15428 1/20 0.45
SRD5A2 P31213 2/20 0.44
KDM4E B2RXH2 2/20 0.44
MAPT P10636 2/20 0.44
HIF1A Q16665 2/20 0.44
KMT2A Q03164 2/20 0.44
SLC22A6 Q4U2R8 1/20 0.44
SLC22A8 Q8TCC7 1/20 0.44
CA12 O43570 3/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Aminobenzoic Acid SCHEMBL2107999 1.00 ALDH1A1 (0.52) ALDH1A1TSHRTP53PRSS1PRSS2
Aminobenzoic Acid SCHEMBL5068633 0.98 ALDH1A1 (0.50) ALDH1A1TSHRTP53PRSS1PRSS2
SCHEMBL49984 0.89 TSHR (0.63) ALDH1A1TSHRTP53PRSS1PRSS2
Terephthalic Acid SCHEMBL28453225 0.89 TSHR (0.63) ALDH1A1TSHRTP53PRSS1PRSS2
Terephthalic Acid SCHEMBL28358133 0.89 TSHR (0.63) ALDH1A1TSHRTP53PRSS1PRSS2
Ammonia Solution, Strong SCHEMBL11061336 0.87 TSHR (0.60) ALDH1A1TSHRTP53PRSS1PRSS2
Bicarbonate SCHEMBL932925 0.87 TSHR (0.48) ALDH1A1TSHRPRSS1PRSS2PRSS3
SCHEMBL15251986 0.87 TSHR (0.60) ALDH1A1TSHRTP53PRSS1PRSS2
SCHEMBL10570096 0.87 TSHR (0.60) ALDH1A1TSHRTP53PRSS1PRSS2
SCHEMBL900338 0.85 GFER (0.61) ALDH1A1TSHRTP53ANPEPENPEP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113820920-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2023-07-04 CN disclosed
CN-115718406-A Photosensitive resin composition for forming resist, resin film, cured film, and semiconductor device 住友电木株式会社 2023-02-28 CN disclosed
CN-109153841-B Resin composition 东丽株式会社 2021-12-31 CN disclosed
CN-113820920-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-12-21 CN disclosed
CN-107850844-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2021-09-07 CN disclosed