SCHEMBL28637388

SCHEMBL28637388

C=CC(=O)O[Si](OC)(OC)OCc1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.40
HCAR2 Q8TDS4 1/20 0.40
THRB P10828 2/20 0.38
LMNA P02545 2/20 0.38
TGM2 P21980 1/20 0.37
CYP3A4 P08684 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
MAPK1 P28482 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
SLC6A2 P23975 1/20 0.36
SLC6A3 Q01959 1/20 0.36
KMT2A Q03164 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA12 O43570 1/20 0.35
AKR1B10 O60218 1/20 0.35
AKR1B1 P15121 1/20 0.35
CA4 P22748 1/20 0.35
CA6 P23280 1/20 0.35
CA5A P35218 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27806780 0.78 ALDH1A1 (0.39) ALDH1A1HCAR2THRBLMNATGM2
SCHEMBL1064321 0.77 THRB (0.42) ALDH1A1HCAR2THRBLMNATGM2
SCHEMBL3338125 0.77 TSHR (0.48) ALDH1A1LMNACYP2C19MAPK1L3MBTL1
SCHEMBL766785 0.77 TSHR (0.48) ALDH1A1LMNACYP2C19MAPK1L3MBTL1
SCHEMBL3338914 0.77 TSHR (0.48) ALDH1A1LMNACYP2C19MAPK1L3MBTL1
SCHEMBL1066659 0.75 TSHR (0.37) ALDH1A1HCAR2THRBLMNATGM2
SCHEMBL1067116 0.74 THRB (0.42) ALDH1A1HCAR2THRBLMNATGM2
SCHEMBL766050 0.74 ALDH1A1 (0.60) ALDH1A1HCAR2LMNAMAPK1L3MBTL1
SCHEMBL27500757 0.74 TSHR (0.37) ALDH1A1THRBCYP3A4MAPK1HPGD
SCHEMBL1064320 0.73 THRB (0.44) ALDH1A1HCAR2THRBLMNATGM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024242171-A1 RADIATION-SENSITIVE COMPOSITION FOR FORMING GATE INSULATING FILM, PATTERN, METHOD FOR PRODUCING PATTERN, CURED FILM FOR GATE INSULATING FILM, SEMICONDUCTOR ELEMENT, ORGANIC ELECTROCHEMICAL TRANSISTOR, ORGANIC EL DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE, MICRO-LED DISPLAY DEVICE, QUANTUM DOT LIGHT-EMITTING DISPLAY DEVICE, WEARABLE DEVICE, ELECTRONIC SKIN DEVICE, BIOLOGICAL SENSOR, AND NEUROMORPHIC DEVICE JSR株式会社 2024-11-28 WO disclosed
CN-115963697-A Radiation-sensitive composition, cured film, method for producing cured film, and display device JSR株式会社 2023-04-14 CN disclosed
CN-114488688-A Liquid crystal display element, method for producing same, and radiation-sensitive resin composition JSR株式会社 2022-05-13 CN disclosed
CN-113552769-A Radiation-sensitive composition, cured film and method for producing same, semiconductor element, display element, and polymer JSR株式会社 2021-10-26 CN disclosed