Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.60 |
| ▸ | MAOB | P27338 | 3/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.44 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | BRD4 | O60885 | 1/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.42 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.41 |
| ▸ | NR4A2 | P43354 | 1/20 | 0.41 |
| ▸ | NR4A3 | Q92570 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1054231 | 0.79 | CES1 (0.44) | ALDH1A1MAPK1L3MBTL1SLC6A2SLC6A3 | |
| SCHEMBL766418 | 0.79 | TSHR (0.57) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| SCHEMBL11574750 | 0.79 | ALDH1A1 (0.49) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| E1501 SCHEMBL43745 | 0.75 | ALDH1A1 (1.00) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| E1501 SCHEMBL14031569 | 0.75 | ALDH1A1 (1.00) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| SCHEMBL3338914 | 0.75 | TSHR (0.48) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| SCHEMBL766785 | 0.75 | TSHR (0.48) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| SCHEMBL3338125 | 0.75 | TSHR (0.48) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| E1501 SCHEMBL901210 | 0.75 | ALDH1A1 (1.00) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 | |
| E1501 SCHEMBL28201296 | 0.75 | ALDH1A1 (1.00) | ALDH1A1MAOBMAPK1L3MBTL1SLC6A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4469418-A1 | IMPROVED ARTIFICIAL AGGLOMERATED MATERIAL | Cosentino Research & Development, S.L. (ES) | 2024-12-04 | — | — | EP | claimed |
| WO-2023143826-A1 | IMPROVED ARTIFICIAL AGGLOMERATED MATERIAL | COSENTINO RESEARCH & DEVELOPMENT, S.L. (ES) | 2023-08-03 | — | — | WO | claimed |
| US-20230234888-A1 | ARTIFICIAL AGGLOMERATED MATERIAL | COSENTINO RESEARCH & DEVELOPMENT, S.L. (ES) | 2023-07-27 | — | — | US | claimed |
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| US-20250326936-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL INC (US) | 2025-10-23 | — | — | US | disclosed |
| US-12269059-B2 | Silicone compositions and methods related thereto | NUSIL TECHNOLOGY LLC (US) | 2025-04-08 | — | — | US | disclosed |
| US-20070057235-A1 | Additives to prevent degradation of cyclic alkene derivatives | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2007-03-15 | — | — | US | disclosed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | disclosed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | disclosed |