Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM1A | O60341 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.51 |
| ▸ | HPGD | P15428 | 7/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.48 |
| ▸ | MAPT | P10636 | 6/20 | 0.44 |
| ▸ | GLA | P06280 | 5/20 | 0.44 |
| ▸ | GAA | P10253 | 5/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | CASP3 | P42574 | 1/20 | 0.44 |
| ▸ | RECQL | P46063 | 1/20 | 0.44 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.44 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.44 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.44 |
| ▸ | MEN1 | O00255 | 4/20 | 0.44 |
| ▸ | APEX1 | P27695 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28126232 | 0.89 | ALDH1A1 (0.68) | KDM1AALDH1A1HPGDKDM4EKMT2A | |
| SCHEMBL11124065 | 0.82 | KDM1A (0.46) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL11050112 | 0.79 | ALDH1A1 (0.46) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL11166383 | 0.79 | KDM1A (0.53) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL9473152 | 0.77 | EGFR (0.51) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL14275213 | 0.73 | KDM1A (0.42) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL22331106 | 0.73 | L3MBTL1 (0.42) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL27567671 | 0.72 | KDM1A (0.41) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL27594191 | 0.72 | ERBB2 (0.38) | KDM1AALDH1A1HPGDKDM4EMAPT | |
| SCHEMBL11153238 | 0.70 | L3MBTL1 (0.40) | KDM1AALDH1A1HPGDKDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0026088-B1 | PHOTORESIST COMPOSITIONS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-11-23 | — | — | EP | claimed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | claimed |
| EP-0026088-A2 | Photoresist compositions | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-04-01 | — | — | EP | claimed |
| CN-118978485-A | Pyrazolinyl sulfonium salt compound with two-photon absorption property, and synthetic method and application thereof | 浙江扬帆新材料股份有限公司 | 2024-11-19 | — | — | CN | disclosed |
| CN-114751861-B | Intramolecular sensitized macromolecular photoinitiator containing pyrazoline and N, N-dialkyl benzoate and preparation method and application thereof | 浙江扬帆新材料股份有限公司 | 2023-10-20 | — | — | CN | disclosed |
| CN-114751861-A | Intramolecular sensitization macromolecule photoinitiator containing pyrazoline and N, N-dialkyl benzoate, preparation method and application thereof | 浙江扬帆新材料股份有限公司 | 2022-07-15 | — | — | CN | disclosed |
| US-10818806-B2 | Cathode of solar unit and solar cell | BOE TECHNOLOGY GROUP CO., LTD (CN) | 2020-10-27 | — | — | US | disclosed |
| US-20200185550-A1 | CATHODE OF SOLAR UNIT AND METHOD FOR MANUFACTURING THEREOF, AND SOLAR CELL | BOE TECHNOLOGY GROUP CO., LTD | 2020-06-11 | — | — | US | disclosed |
| US-10608127-B2 | Method for manufacturing cathode of solar unit | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2020-03-31 | — | — | US | disclosed |
| CN-106293253-B | Touch sensing and preparation method thereof and touch sensing unit | 京东方科技集团股份有限公司 | 2019-05-28 | — | — | CN | disclosed |
| CN-106384566-B | Dot structure, pixel electrode and preparation method thereof | 京东方科技集团股份有限公司 | 2019-05-17 | — | — | CN | disclosed |
| EP-0126991-A1 | A method for preventing deposition of polymer scale and a coating agent therefor | Shin-Etsu Chemical Co., Ltd. (JP) | 1984-12-05 | — | — | EP | disclosed |
| US-4425179-A | ACTIVATORS, ACRYLIC AND METHACRYLIC ESTERS | USM CORPORATION (US) | 1984-01-10 | — | — | US | disclosed |
| EP-0026088-B1 | PHOTORESIST COMPOSITIONS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1983-11-23 | — | — | EP | disclosed |
| US-4410621-A | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan | TOYO BOSEKI KABUSHIKI KAISHA (JP) | 1983-10-18 | — | — | US | disclosed |
| US-4405705-A | HYDROPHILIC | TOYO BOSEKI KABUSHIKI KAISHA T/A TOYOBA CO., LTD. (JP) | 1983-09-20 | — | — | US | disclosed |
| US-4366208-A | MICROWAVES, PLASMA/GASES/, POLYMERIZATION, HALOGEN COMPOUND | TOKYO SHIBAURA DENKI KABUSHIKI KAISHA (JP) | 1982-12-28 | — | — | US | disclosed |
| US-4349619-A | CONTAINING ANTIHALATION AGENTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1982-09-14 | — | — | US | disclosed |
| EP-0026088-A2 | Photoresist compositions | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1981-04-01 | — | — | EP | disclosed |
| US-4150985-A | Image forming process involving phase change | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1979-04-24 | — | — | US | disclosed |