SCHEMBL28658644

SCHEMBL28658644

CC(C)C=COCC(O)CO

nearest known ligand 0.35

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.35
CYP1A2 P05177 2/20 0.35
AGTR1 P30556 1/20 0.35
USP2 O75604 1/20 0.34
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TDP1 Q9NUW8 1/20 0.32
KDM4E B2RXH2 2/20 0.32
DUSP3 P51452 1/20 0.31
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4388055 0.77
SCHEMBL8134429 0.77
SCHEMBL25366726 0.75
SCHEMBL6667563 0.75 LMNA (0.38) LMNACYP1A2AGTR1USP2ALDH1A1
SCHEMBL8154647 0.72
SCHEMBL28007866 0.71 USP2 (0.35) LMNAUSP2ALDH1A1
SCHEMBL8538464 0.70
SCHEMBL20475887 0.70 GAPDH (0.35) LMNAUSP2ALDH1A1KDM4EDUSP3
SCHEMBL28829221 0.70 ALDH1A1 (0.33) LMNAUSP2ALDH1A1
SCHEMBL27566387 0.70 LMNA (0.33) LMNAUSP2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114072439-B Curable composition and resin composition for photofabrication comprising same 株式会社可乐丽 2024-05-14 CN disclosed
CN-114981026-A Metal particle composition, method for producing metal particle composition, and paste 株式会社可乐丽 2022-08-30 CN disclosed
CN-114072439-A Curable composition and resin composition for stereolithography comprising same 株式会社可乐丽 2022-02-18 CN disclosed
CN-113661195-A Polymer, oxygen absorber using the same, and curable composition 株式会社可乐丽 2021-11-16 CN disclosed