SCHEMBL2866687

SCHEMBL2866687

C=C(C=CC(=O)O)C(=O)OCC.C=COC(C)=O

nearest known ligand 0.44

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 5/20 0.44
GLO1 Q04760 1/20 0.36
ALDH1A1 P00352 6/20 0.35
LMNA P02545 1/20 0.35
HSD17B10 Q99714 1/20 0.35
TSHR P16473 1/20 0.35
MAPT P10636 2/20 0.33
CYP2D6 P10635 2/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
THRB P10828 1/20 0.31
EGLN1 Q9GZT9 1/20 0.31
CYP2C19 P33261 1/20 0.31
CYP1A2 P05177 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL40331 0.87 HCAR2 (0.57) HCAR2GLO1ALDH1A1LMNAHSD17B10
SCHEMBL5132884 0.85 HCAR2 (0.50) HCAR2ALDH1A1LMNATSHRMAPT
Butadiene SCHEMBL11410298 0.85 HCAR2 (0.52) HCAR2GLO1ALDH1A1TSHRMAPT
Acrylic Acid SCHEMBL11216503 0.85 HCAR2 (0.52) HCAR2GLO1ALDH1A1LMNAHSD17B10
Methacrylic Acid SCHEMBL3440748 0.83 HCAR2 (0.50) HCAR2GLO1ALDH1A1LMNAHSD17B10
Ethyl Fumarate SCHEMBL9678685 0.82 HCAR2 (0.69) HCAR2ALDH1A1LMNAHSD17B10MAPT
Ethyl Fumarate SCHEMBL9678697 0.82 HCAR2 (0.69) HCAR2ALDH1A1LMNAHSD17B10MAPT
SCHEMBL5678091 0.82 HCAR2 (0.39) HCAR2ALDH1A1HSD17B10TSHRMAPT
1,1-Dichloroethene SCHEMBL6373416 0.82 HCAR2 (0.52) HCAR2GLO1ALDH1A1TSHRMAPT
Maleic Acid SCHEMBL1766045 0.81 HCAR2 (0.56) HCAR2ALDH1A1LMNAHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8431289-B2 Photosensitive composition for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram DAI NIPPON PRINTING CO., LTD. (JP) 2013-04-30 US disclosed
US-7824822-B2 Photosensitive compositions for volume hologram recording, photosensitive medium for volume hologram recording and volume hologram DAI NIPPON PRINTING CO., LTD. (JP) 2010-11-02 US disclosed
US-20100266936-A1 PHOTOSENSITIVE COMPOSITION FOR VOLUME HOLOGRAM RECORDING, PHOTOSENSITIVE MEDIUM FOR VOLUME HOLOGRAM RECORDING AND VOLUME HOLOGRAM DAI NIPPON PRINTING CO., LTD. (JP) 2010-10-21 US disclosed
US-20040137334-A1 Volume hologram recording photosensitive composition, volume hologram recording photosensitive medium and volume hologram DAI NIPPON PRINTING CO., LTD. (JP) 2004-07-15 US disclosed
EP-0031964-B1 SEQUENTIAL EMULSION POLYMERIZATION PROCESS FOR STRUCTURED PARTICLE LATEX PRODUCTS THE DOW CHEMICAL COMPANY (US) 1986-03-05 EP disclosed
US-4325856-A POLYMERS/SHELL-CORE/, UNSATURATED ESTER, CONJUGATED DIENE, VINYLAR THE DOW CHEMICAL COMPANY (US) 1982-04-20 US disclosed
EP-0031964-A2 Sequential emulsion polymerization process for structured particle latex products THE DOW CHEMICAL COMPANY (US) 1981-07-15 EP disclosed