SCHEMBL28670536

SCHEMBL28670536

CC(C(=O)O)c1ncncn1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 10/20 0.36
LMNA P02545 4/20 0.35
PTGS1 P23219 7/20 0.34
AKR1C3 P42330 4/20 0.34
CXCR1 P25024 4/20 0.34
CXCR2 P25025 4/20 0.34
AKR1C2 P52895 3/20 0.34
CYP2C9 P11712 2/20 0.34
SLC22A6 Q4U2R8 2/20 0.34
CXCL8 P10145 2/20 0.34
PMP22 Q01453 2/20 0.34
ALB P02768 1/20 0.34
ESR1 P03372 1/20 0.34
ALOX5 P09917 1/20 0.34
RARB P10826 1/20 0.34
ADRB3 P13945 1/20 0.34
NFKB1 P19838 1/20 0.34
HTR2A P28223 1/20 0.34
NR1I3 Q14994 1/20 0.34
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30066697 0.80 EPHX1 (0.36)
SCHEMBL8831554 0.79 PTGS2 (0.42) PTGS2LMNAPTGS1AKR1C3CXCR1
Hydrochloric Acid SCHEMBL22775404 0.77 PTGS2 (0.41) PTGS2LMNAPTGS1AKR1C3CXCR1
SCHEMBL1574016 0.74 LMNA (0.39) LMNABLMPOLBMAPK1
SCHEMBL17765175 0.70 KMT2A (0.43) LMNAAKR1C3AKR1C2POLBSMN1; SMN2
SCHEMBL27405232 0.68 PTGS2 (0.45) PTGS2LMNAPTGS1AKR1C3CXCR1
SCHEMBL2370298 0.67 AKR1C3 (0.38) PTGS2LMNAPTGS1AKR1C3AKR1C2
Hydrochloric Acid SCHEMBL29604427 0.67 POLB (0.36) PTGS2LMNAPTGS1AKR1C3CXCR1
SCHEMBL4662149 0.67 PTGS2 (0.39) PTGS2LMNAPTGS1AKR1C3CXCR1
SCHEMBL22549546 0.65 HSP90AA1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114008537-A Stripping composition for removing photoresist from semiconductor substrate 富士胶片电子材料美国有限公司 2022-02-01 CN disclosed
CN-109195720-B Stripping composition for removing photoresist from semiconductor substrate 富士胶片电子材料美国有限公司 2021-10-29 CN disclosed