Hydrochloric Acid

Hydrochloric Acid

SCHEMBL28686705

CC[N+](C)(CC)C(C)C.[Cl-]

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.35
PMP22 Q01453 1/20 0.35
ATM Q13315 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1834011 0.96
Bromide SCHEMBL31683081 0.93
Iodide SCHEMBL31683076 0.93
Fluoride Ion SCHEMBL31683108 0.93
Water SCHEMBL31683015 0.93
SCHEMBL19409371 0.84
SCHEMBL12790570 0.83 TSHR (0.32)
Bicarbonate SCHEMBL28583178 0.80 BBOX1 (0.40)
SCHEMBL5944643 0.78
SCHEMBL1833627 0.78 SLC22A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113926427-B Modified graphene film for capturing carbon dioxide in air and preparation method thereof 济南产研国能中碳环保技术有限公司 2024-07-19 CN claimed
CN-113926427-A Modified graphene membrane for capturing carbon dioxide in air and preparation method thereof 西安绿碳资源循环科技有限公司 2022-01-14 CN claimed
US-20260071095-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2026-03-12 US disclosed
US-20250320381-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2025-10-16 US disclosed
US-20250282977-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR SUBSTRATE FUJIMI INCORPORATED (JP) 2025-09-11 US disclosed
CN-113926427-B Modified graphene film for capturing carbon dioxide in air and preparation method thereof 济南产研国能中碳环保技术有限公司 2024-07-19 CN disclosed
CN-113926427-A Modified graphene membrane for capturing carbon dioxide in air and preparation method thereof 西安绿碳资源循环科技有限公司 2022-01-14 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260071095-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE PIEZO1, ZAP70, CAPN1 KDM4E 2494/4885PMP22 1214/4885ATM 519/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.