SCHEMBL2869705

SCHEMBL2869705

CC(F)C(F)(F)C(F)(F)S(=O)(=O)[O-].CCCC[n+]1ccn(C)c1

nearest known ligand 0.32

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.32
MAPT P10636 4/20 0.32
HTT P42858 3/20 0.32
SMN1; SMN2 Q16637 2/20 0.32
APAF1 O14727 3/20 0.31
KMT2A Q03164 2/20 0.31
NPSR1 Q6W5P4 2/20 0.31
LMNA P02545 1/20 0.31
CASP3 P42574 1/20 0.31
SENP8 Q96LD8 1/20 0.31
SENP7 Q9BQF6 1/20 0.31
SENP6 Q9GZR1 1/20 0.31
KDM4E B2RXH2 4/20 0.31
RXFP1 Q9HBX9 2/20 0.30
MEN1 O00255 1/20 0.30
MITF O75030 1/20 0.30
BLM P54132 1/20 0.30
PABPC1 P11940 1/20 0.30
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15301421 0.92 ALDH1A1 (0.33) ALDH1A1MAPTHTTSMN1; SMN2APAF1
SCHEMBL23610145 0.88
Trifluoromethanesulfonic Acid SCHEMBL192398 0.85 ACHE (0.40) ALDH1A1MAPTHTTSMN1; SMN2NPSR1
SCHEMBL357139 0.84 ALDH1A1 (0.34) ALDH1A1MAPTHTTSMN1; SMN2APAF1
SCHEMBL1737364 0.84 MAPT (0.32) ALDH1A1MAPTHTTSMN1; SMN2APAF1
Trifluoromethanesulfonic Acid SCHEMBL28555818 0.83 ACHE (0.40) ALDH1A1MAPTHTTSMN1; SMN2NPSR1
SCHEMBL358055 0.83 MAPT (0.34) ALDH1A1MAPTHTTSMN1; SMN2APAF1
SCHEMBL1172288 0.83 KDM4E (0.31) ALDH1A1MAPTHTTSMN1; SMN2APAF1
Hydrochloric Acid SCHEMBL534993 0.82 MAPT (0.33) ALDH1A1MAPTHTTSMN1; SMN2APAF1
Trifluoromethanesulfonic Acid SCHEMBL2230280 0.81 ACHE (0.38) ALDH1A1MAPTHTTSMN1; SMN2NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120291944-A1 METHOD OF PRODUCING ELECTRONIC COMPONENT NITTO DENKO CORPORATION (JP) 2012-11-22 US disclosed
EP-2246404-A1 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film NITTO DENKO CORPORATION (JP) 2010-11-03 EP disclosed
EP-1582573-B1 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film NITTO DENKO CORP (JP) 2010-10-13 EP disclosed
US-7691925-B2 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film NITTO DENKO CORPORATION (JP) 2010-04-06 US disclosed
EP-1889889-A2 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film Nitto Denko Corporation (JP) 2008-02-20 EP disclosed
EP-1582573-A2 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film Nitto Denko Corporation (JP) 2005-10-05 EP disclosed
US-20050197450-A1 Pressure-sensitive adhesive composition, pressure-sensitive adhesive sheets and surface protecting film NITTO DENKO CORPORATION (JP) 2005-09-08 US disclosed