SCHEMBL2879206

SCHEMBL2879206

C=Cc1ccc2cc(C(=O)OC(C)C(=O)C(F)(F)S(=O)(=O)O)ccc2c1

nearest known ligand 0.32

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.32
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA14 Q9ULX7 1/20 0.32
GABBR2 O75899 3/20 0.31
GABBR1 Q9UBS5 3/20 0.31
ADRB2 P07550 1/20 0.31
ADRB1 P08588 1/20 0.31
ADRB3 P13945 1/20 0.31
MEN1 O00255 1/20 0.31
NPC1 O15118 1/20 0.31
RAB9A P51151 1/20 0.31
KMT2A Q03164 1/20 0.31
TAS1R3 Q7RTX0 1/20 0.30
TAS1R1 Q7RTX1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9966160 0.88 TDP1 (0.36) CA12CA1CA2CA7CA9
SCHEMBL12376819 0.84 GABBR2 (0.33) CA12CA1CA2CA7CA9
SCHEMBL12465264 0.83 TDP1 (0.34) GABBR2GABBR1MEN1KMT2A
SCHEMBL12119777 0.81 MAPT (0.31) GABBR2GABBR1MEN1NPC1RAB9A
SCHEMBL2886439 0.78
SCHEMBL2742177 0.76 HRH3 (0.34) ADRB2ADRB1ADRB3RAB9A
SCHEMBL10134937 0.74 TDP1 (0.36) ADRB2ADRB1ADRB3MEN1NPC1
SCHEMBL18470400 0.73 TDP1 (0.31) ADRB2ADRB1ADRB3MEN1KMT2A
SCHEMBL12398400 0.72 SMN1; SMN2 (0.38) CA12CA1CA2CA9GABBR2
SCHEMBL2742183 0.71 TDP1 (0.38) CA12CA1CA2CA7CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120082939-A1 ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE RESIN COMPOSITION, AND ACTIVE LIGHT RAY SENSITIVE OR RADIOACTIVE RAY SENSITIVE FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2012-04-05 US disclosed
US-20120034559-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-20120003583-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed
US-20110318693-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed