Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PLK1 | P53350 | 1/20 | 0.41 |
| ▸ | PLK3 | Q9H4B4 | 1/20 | 0.41 |
| ▸ | THRA | P10827 | 2/20 | 0.40 |
| ▸ | THRB | P10828 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | CNR2 | P34972 | 1/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
| ▸ | ALOX15B | O15296 | 1/20 | 0.38 |
| ▸ | PLA2G1B | P04054 | 4/20 | 0.38 |
| ▸ | ATG4B | Q9Y4P1 | 4/20 | 0.38 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2880829 | 1.00 | PLK1 (0.41) | PLK1PLK3THRATHRBCA2 | |
| SCHEMBL36667 | 0.88 | CA2 (0.42) | THRATHRBCA2PLA2G1BATG4B | |
| SCHEMBL36666 | 0.88 | CA2 (0.42) | THRATHRBCA2PLA2G1BATG4B | |
| SCHEMBL7789356 | 0.87 | SMPD1 (0.46) | PLK1CNR2 | |
| SCHEMBL7789358 | 0.87 | SMPD1 (0.46) | PLK1CNR2 | |
| SCHEMBL7781699 | 0.87 | CA2 (0.39) | THRATHRBCA2PLA2G1BATG4B | |
| SCHEMBL7781697 | 0.87 | CA2 (0.39) | THRATHRBCA2PLA2G1BATG4B | |
| SCHEMBL5918261 | 0.85 | EP300 (0.45) | CA2CYP1A2TDP1 | |
| SCHEMBL5918260 | 0.85 | EP300 (0.45) | CA2CYP1A2TDP1 | |
| SCHEMBL547022 | 0.82 | FAAH (0.43) | PLK1PLK3THRATHRBCA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1324134-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2010-10-20 | — | — | EP | disclosed |
| US-6866982-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-15 | — | — | US | disclosed |
| US-6835530-B2 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. (JP) | 2004-12-28 | — | — | US | disclosed |
| US-20040121260-A1 | Base material for lithography | TOKYO OHKA KOGYO CO., LTD. | 2004-06-24 | — | — | US | disclosed |
| US-6635400-B2 | Alkali-insoluble polymer having acidic groups protected with acid labile groups, photoacid generator, and 1,2-naphthoquinonediazidosulfonyl group-bearing compound; high resolution; plating resistance | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-10-21 | — | — | US | disclosed |
| US-20030175617-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-09-18 | — | — | US | disclosed |
| EP-1324134-A2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-07-02 | — | — | EP | disclosed |
| EP-0780729-B1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2002-07-10 | — | — | EP | disclosed |
| US-20010044066-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-11-22 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| US-6063953-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-05-16 | — | — | US | disclosed |
| US-5902713-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| EP-0780729-A1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-06-25 | — | — | EP | disclosed |