Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | ATG4B | Q9Y4P1 | 11/20 | 0.40 |
| ▸ | PLA2G1B | P04054 | 9/20 | 0.40 |
| ▸ | THRA | P10827 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | HAO1 | Q9UJM8 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36667 | 1.00 | CA2 (0.42) | CA2ATG4BPLA2G1BTHRATHRB | |
| SCHEMBL2880826 | 0.88 | PLK1 (0.41) | CA2ATG4BPLA2G1BTHRATHRB | |
| SCHEMBL2880829 | 0.88 | PLK1 (0.41) | CA2ATG4BPLA2G1BTHRATHRB | |
| SCHEMBL7781699 | 0.87 | CA2 (0.39) | CA2ATG4BPLA2G1BTHRATHRB | |
| SCHEMBL7781697 | 0.87 | CA2 (0.39) | CA2ATG4BPLA2G1BTHRATHRB | |
| SCHEMBL7789356 | 0.83 | SMPD1 (0.46) | — | |
| SCHEMBL7789358 | 0.83 | SMPD1 (0.46) | — | |
| SCHEMBL10639475 | 0.81 | CES2 (0.41) | — | |
| SCHEMBL10639469 | 0.81 | CES2 (0.41) | — | |
| SCHEMBL7976575 | 0.80 | KDM4E (0.49) | THRBTDP1RECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 729 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230176479-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| EP-3896522-B1 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| EP-4167028-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-19 | — | — | EP | disclosed |
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| US-11460774-B2 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| US-11256174-B2 | Pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-02-22 | — | — | US | disclosed |
| US-6268108-B1 | MIXTURE OF COMPOUND FORMING ACID UPON EXPOSURE OF ACTINIC RADIATION, COMPOUND CAPABLE OF CROSSLINKING, DYE AND SOLVENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2001-07-31 | — | — | US | disclosed |
| EP-1103856-A1 | Positive resist composition & process for forming resist pattern using same | Central Glass Company, Limited (JP) | 2001-05-30 | — | — | EP | disclosed |
| US-6077644-A | Positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-6063953-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-05-16 | — | — | US | disclosed |
| US-6022666-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-02-08 | — | — | US | disclosed |
| US-5929271-A | Compounds for use in a positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5902713-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| EP-0780729-A1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-06-25 | — | — | EP | disclosed |
| EP-0241423-B1 | PROCESS FOR THE PRODUCTION OF POSITIVE IMAGES | CIBA-GEIGY AG (CH) | 1993-09-15 | — | — | EP | disclosed |
| EP-0241423-A2 | Process for the production of positive images | CIBA-GEIGY AG (CH) | 1987-10-14 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11561472-B2 | Radiation sensitive composition | RER1, RAD1, RAD51 | CA2 2513/4885ATG4B 1491/4885PLA2G1B 1885/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | CA2 4815/4885ATG4B 3382/4885PLA2G1B 3535/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.