SCHEMBL2882142

SCHEMBL2882142

O=S(=O)(O)c1ccc(C(F)(F)F)cc1.O=S(=O)(O)c1ccc(F)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
HSD11B1 P28845 2/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
KIF11 P52732 1/20 0.48
NOX4 Q9NPH5 1/20 0.48
MMP1 P03956 3/20 0.44
CA1 P00915 2/20 0.44
CA2 P00918 2/20 0.44
MMP2 P08253 1/20 0.44
MMP9 P14780 1/20 0.44
MMP8 P22894 1/20 0.44
MMP13 P45452 1/20 0.44
CYP1A1 P04798 1/20 0.44
CYP1B1 Q16678 1/20 0.44
CA12 O43570 1/20 0.44
MAPT P10636 1/20 0.44
CA9 Q16790 1/20 0.44
ALDH1A1 P00352 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL230582 0.92 KIF11 (0.55) LMNASMN1; SMN2KIF11MMP1CA1
Fluorobenzene SCHEMBL2882224 0.91 TSHR (0.52) LMNASMN1; SMN2HSD11B1MEN1KMT2A
Hydrochloric Acid SCHEMBL4589695 0.90 KIF11 (0.53) LMNASMN1; SMN2HSD11B1KIF11MMP1
SCHEMBL15568689 0.90 KIF11 (0.53) LMNASMN1; SMN2HSD11B1KIF11MMP1
SCHEMBL6115108 0.90 KIF11 (0.53) LMNASMN1; SMN2HSD11B1KIF11MMP1
Ethylene SCHEMBL28421049 0.88 KIF11 (0.52) LMNASMN1; SMN2HSD11B1KIF11MMP1
SCHEMBL2894832 0.86 KIF11 (0.66) LMNAKIF11MMP1MMP2MMP9
SCHEMBL66196 0.85 LMNA (0.59) LMNASMN1; SMN2MEN1KMT2AMMP1
SCHEMBL16563273 0.84 KIF11 (0.48) LMNASMN1; SMN2HSD11B1KIF11MMP1
SCHEMBL16563207 0.84 KIF11 (0.48) LMNASMN1; SMN2KIF11MMP1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146247-B1 Resist patterning process and manufacturing photo mask SHINETSU CHEMICAL CO (JP) 2015-04-15 EP disclosed
EP-2146247-A1 Resist patterning process and manufacturing photo mask Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed
US-20100009271-A1 Resist patterning process and manufacturing photo mask SHIN-ETSU CHEMICAL CO., LTD (JP) 2010-01-14 US disclosed