Fluorobenzene

Fluorobenzene

SCHEMBL2882224

Fc1ccccc1.O=S(=O)(O)c1ccc(C(F)(F)F)cc1

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.52
SMN1; SMN2 Q16637 2/20 0.52
HSD11B1 P28845 4/20 0.46
POLB P06746 2/20 0.46
CYP2D6 P10635 1/20 0.46
ALDH1A1 P00352 2/20 0.45
KIF11 P52732 2/20 0.44
EEF2K O00418 2/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
KEAP1 Q14145 1/20 0.43
NFE2L2 Q16236 1/20 0.43
LMNA P02545 1/20 0.43
PKM P14618 1/20 0.42
TRPV6 Q9H1D0 1/20 0.42
NOX4 Q9NPH5 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2882142 0.91 LMNA (0.50) TSHRSMN1; SMN2HSD11B1ALDH1A1KIF11
SCHEMBL230582 0.87 KIF11 (0.55) TSHRSMN1; SMN2ALDH1A1KIF11LMNA
SCHEMBL6115108 0.85 KIF11 (0.53) TSHRSMN1; SMN2HSD11B1ALDH1A1KIF11
Hydrochloric Acid SCHEMBL4589695 0.85 KIF11 (0.53) TSHRSMN1; SMN2HSD11B1ALDH1A1KIF11
SCHEMBL15568689 0.85 KIF11 (0.53) TSHRSMN1; SMN2HSD11B1ALDH1A1KIF11
Ethylene SCHEMBL28421049 0.83 KIF11 (0.52) TSHRSMN1; SMN2HSD11B1ALDH1A1KIF11
Fluorobenzene SCHEMBL28170476 0.82 TSHR (0.76) TSHRSMN1; SMN2HSD11B1POLBCYP2D6
SCHEMBL2894832 0.81 KIF11 (0.66) KIF11LMNA
SCHEMBL3683218 0.81 TSHR (0.55) TSHRSMN1; SMN2HSD11B1POLBCYP2D6
Benzene SCHEMBL28435487 0.80 TSHR (0.64) TSHRSMN1; SMN2HSD11B1POLBCYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2146247-B1 Resist patterning process and manufacturing photo mask SHINETSU CHEMICAL CO (JP) 2015-04-15 EP disclosed
EP-2146247-A1 Resist patterning process and manufacturing photo mask Shin-Etsu Chemical Co., Ltd. (JP) 2010-01-20 EP disclosed