SCHEMBL4763671

SCHEMBL4763671

O=C(OC(C(F)(F)F)C(F)(F)F)c1ccccc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.57
TP53 P04637 1/20 0.57
LMNA P02545 2/20 0.50
F2 P00734 1/20 0.50
KMT2A Q03164 4/20 0.49
MGLL Q99685 1/20 0.47
CES1 P23141 1/20 0.47
PDCD1 Q15116 1/20 0.46
CD274 Q9NZQ7 1/20 0.46
MAPK1 P28482 1/20 0.46
HIF1A Q16665 1/20 0.46
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
ALDH1A1 P00352 4/20 0.44
TDP1 Q9NUW8 3/20 0.44
HSD17B10 Q99714 1/20 0.44
NPC1 O15118 1/20 0.44
HTT P42858 1/20 0.44
RAB9A P51151 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27469262 0.90 CA12 (0.45) TSHRTP53KMT2AMGLLCES1
SCHEMBL13642061 0.89 TSHR (0.50) TSHRTP53LMNAF2KMT2A
SCHEMBL23190361 0.89 TSHR (0.50) TSHRTP53LMNAF2KMT2A
SCHEMBL17093438 0.86 GABRA1 (0.43) TSHRTP53KMT2AMGLLNPC1
SCHEMBL14554296 0.86 TSHR (0.47) TSHRTP53LMNAF2KMT2A
SCHEMBL382685 0.86 TSHR (0.47) TSHRTP53LMNAF2KMT2A
SCHEMBL14369585 0.85 TSHR (0.46) TSHRTP53LMNAF2KMT2A
Hydrogen Sulfide SCHEMBL2882266 0.85 TSHR (0.46) TSHRTP53LMNAF2KMT2A
SCHEMBL482458 0.85 TSHR (0.46) TSHRTP53LMNAF2KMT2A
SCHEMBL15114256 0.85 TSHR (0.46) TSHRTP53LMNAF2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9427777-B2 Process for producing charge retention medium ASAHI GLASS COMPANY, LIMITED (JP) 2016-08-30 US disclosed
EP-2648197-A1 METHOD FOR PRODUCING CHARGE RETENTION MEDIUM Asahi Glass Company, Limited (JP) 2013-10-09 EP disclosed
EP-2648196-A1 CHARGE RETENTION MEDIUM Asahi Glass Company, Limited (JP) 2013-10-09 EP disclosed
US-20130261248-A1 CHARGE RETENTION MEDIUM ASAHI GLASS COMPANY, LIMITED (JP) 2013-10-03 US disclosed
US-20130202810-A1 PROCESS FOR PRODUCING CHARGE RETENTION MEDIUM ASAHI GLASS COMPANY, LIMITED (JP) 2013-08-08 US disclosed
US-20130053493-A1 METHOD FOR PRODUCING FLUORINATED COPOLYMER COMPOSITION, COATING COMPOSITION, ARTICLE HAVING COATING FILM, AND MOLDED PRODUCT ASAHI GLASS COMPANY, LIMITED (JP) 2013-02-28 US disclosed
EP-2559742-A1 COATING COMPOSITION AND PRODUCTION METHOD FOR SAME, AND FORMATION METHOD FOR COATING FILM USING SAME Asahi Glass Company, Limited (JP) 2013-02-20 EP disclosed
US-20130017334-A1 COATING COMPOSITION AND PROCESS FOR ITS PRODUCTION, AND PROCESS FOR FORMING COATING FILM BY USING THE COMPOSITION ASAHI GLASS COMPANY, LIMITED (JP) 2013-01-17 US disclosed
JP-2008290994-A METHOD FOR PRODUCING FLUORINE-CONTAINING ALKYL ESTER DAIKIN IND LTD 2008-12-04 JP disclosed