SCHEMBL2883305

SCHEMBL2883305

C=CC(=O)OC(C)OC(C)OC(=O)c1ccc(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)O)c(OC)c1

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ALDH1A1 P00352 2/20 0.33
CYP2D6 P10635 1/20 0.33
MAPT P10636 2/20 0.32
TSHR P16473 2/20 0.31
MAOB P27338 1/20 0.31
CYP2C9 P11712 2/20 0.30
CYP1A2 P05177 1/20 0.30
CYP3A4 P08684 1/20 0.30
CYP2C19 P33261 1/20 0.30
KDM4E B2RXH2 1/20 0.30
PDE4A P27815 1/20 0.30
PDE4B Q07343 1/20 0.30
PDE4C Q08493 1/20 0.30
PDE4D Q08499 1/20 0.30
CA12 O43570 1/20 0.30
CA1 P00915 1/20 0.30
CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2886986 0.81 STS (0.33) RAB9ACA12CA1CA2CA7
SCHEMBL13160571 0.80 SMN1; SMN2 (0.40) NPC1RAB9ASMN1; SMN2ALDH1A1MAPT
SCHEMBL9966115 0.77 CA12 (0.54) NPC1RAB9ASMN1; SMN2ALDH1A1MAPT
SCHEMBL2742216 0.72 ALDH1A1 (0.35) NPC1RAB9ASMN1; SMN2ALDH1A1TSHR
SCHEMBL5671791 0.71 NPC1 (0.46) NPC1RAB9ASMN1; SMN2ALDH1A1CYP2D6
SCHEMBL2875568 0.69
SCHEMBL9966159 0.69 TAS1R3 (0.33) CA12CA1CA2CA7CA9
SCHEMBL2886439 0.69
SCHEMBL12039862 0.68 ALOX5 (0.30) MAPTKDM4E
SCHEMBL10233233 0.68 ELANE (0.34) RAB9ASMN1; SMN2ALDH1A1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120034559-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
US-20120003583-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2012-01-05 US disclosed