SCHEMBL2883952

SCHEMBL2883952

O=[N+]([O-])c1ccccc1C[SiH2]

nearest known ligand 0.64

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.64
TSHR P16473 1/20 0.64
HPGD P15428 1/20 0.58
HTT P42858 1/20 0.49
HSD17B10 Q99714 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.47
NPC1 O15118 3/20 0.47
RAB9A P51151 3/20 0.47
RECQL P46063 1/20 0.47
TDP1 Q9NUW8 2/20 0.46
ACHE P22303 1/20 0.46
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
SMN1; SMN2 Q16637 2/20 0.45
CYP3A4 P08684 1/20 0.45
CYP2D6 P10635 1/20 0.45
CYP2C19 P33261 1/20 0.45
ALDH3A1 P30838 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3202573 0.84 ALDH1A1 (0.72) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL301933 0.82 ALDH1A1 (0.69) ALDH1A1TSHRHPGDHTTHSD17B10
Ammonia Solution, Strong SCHEMBL10338964 0.80 ALDH1A1 (0.67) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL29437308 0.80 ALDH1A1 (0.67) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL1150551 0.80 ALDH1A1 (0.67) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL124981 0.80 ALDH1A1 (0.67) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL2883954 0.78 ALDH1A1 (0.64) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL69613 0.78 ALDH1A1 (1.00) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL68381 0.78 ALDH1A1 (0.70) ALDH1A1TSHRHPGDHTTHSD17B10
SCHEMBL1696805 0.78 ALDH1A1 (0.64) ALDH1A1TSHRHPGDHTTHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1662322-B1 Positive type photo-sensitive siloxane composition, curing film formed by the composition and device with the curing film TORAY INDUSTRIES (JP) 2017-01-11 EP disclosed
US-7759451-B2 Fumaric diester copolymer TOSOH CORPORATION (JP) 2010-07-20 US disclosed
US-20070298247-A1 Fumaric diester copolymer TOSOH CORPORATION (JP) 2007-12-27 US disclosed
US-5198520-A Photoresists KABUSHIKI KAISHA TOSHIBA (JP) 1993-03-30 US disclosed
US-5198520-A Photoresists KABUSHIKI KAISHA TOSHIBA (JP) 1993-03-30 US disclosed
EP-0493367-A2 Silicone resist materials containing polysilanes and methods of making the same KABUSHIKI KAISHA TOSHIBA (JP) 1992-07-01 EP disclosed
US-5017453-A Integrated circuits KABUSHIKI KAISHA TOSHIBA (JP) 1991-05-21 US disclosed
US-4822716-A FINE PATTERN SEMICONDUCTOR, INTEGRATED CIRCUIT KABUSHIKI KAISHA TOSHIBA (JP) 1989-04-18 US disclosed
US-4822716-A FINE PATTERN SEMICONDUCTOR, INTEGRATED CIRCUIT KABUSHIKI KAISHA TOSHIBA (JP) 1989-04-18 US disclosed
EP-0231497-A1 Silicone resist materials containing polysiloxanes KABUSHIKI KAISHA TOSHIBA (JP) 1987-08-12 EP disclosed
EP-0231497-A1 Silicone resist materials containing polysiloxanes KABUSHIKI KAISHA TOSHIBA (JP) 1987-08-12 EP disclosed